Invention Grant
- Patent Title: Method for forming vapor deposition film, and method for producing display device
- Patent Title (中): 蒸镀膜的形成方法以及显示装置的制造方法
-
Application No.: US13976437Application Date: 2011-12-20
-
Publication No.: US08906718B2Publication Date: 2014-12-09
- Inventor: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2010-291201 20101227
- International Application: PCT/JP2011/079441 WO 20111220
- International Announcement: WO2012/090771 WO 20120705
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/02 ; H01L27/32 ; H01L51/52 ; H01L51/56 ; H05B33/04 ; H05B33/10 ; H01L33/00 ; H01L51/00 ; C23C14/04 ; C23C16/04
Abstract:
On a surface of a substrate (3) on which surface a vapor-deposited film is to be formed, a photoresist (13) is formed so as to have an opening in a sealing region including a display region (R1) which sealing region is formed by a sealing resin (11) of a frame shape. Then, luminescent layers (8R, 8G, and 8B) having a striped pattern are formed. Subsequently, the photoresist (13) is removed with the use of an exfoliative solution so as to form the luminescent layers (8R, 8G, and 8B) patterned with high definition.
Public/Granted literature
- US20130280839A1 METHOD FOR FORMING VAPOR DEPOSITION FILM, AND METHOD FOR PRODUCING DISPLAY DEVICE Public/Granted day:2013-10-24
Information query
IPC分类:
