发明授权
- 专利标题: Apparatus for the removal of a fluorinated polymer from a substrate
- 专利标题(中): 用于从基材除去氟化聚合物的装置
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申请号: US12750612申请日: 2010-03-30
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公开(公告)号: US08926789B2公开(公告)日: 2015-01-06
- 发明人: Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
- 申请人: Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Martine Penilla Group, LLP
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; H01L21/306 ; C23C16/00 ; H01L21/02 ; B08B7/00
摘要:
An apparatus generating a plasma for removing fluorinated polymer from a substrate is provided. The apparatus includes a powered electrode assembly, which includes a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The apparatus also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated. The first wire mesh is shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the fluorinated polymer.
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