Invention Grant
- Patent Title: Semiconductor device including a MOSFET and Schottky junction
- Patent Title (中): 包括MOSFET和肖特基结的半导体器件
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Application No.: US13844950Application Date: 2013-03-16
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Publication No.: US08928071B2Publication Date: 2015-01-06
- Inventor: Nobuyuki Shirai , Nobuyoshi Matsuura , Yoshito Nakazawa
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Kawasaki-shi
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Miles & Stockbridge P.C.
- Priority: JP2001-329620 20011026
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/78 ; H01L29/872 ; H01L29/45 ; H01L29/10 ; H01L29/06 ; H01L29/40 ; H01L29/08 ; H01L29/47

Abstract:
A semiconductor device has a semiconductor substrate with a plurality of transistor cell regions. Each transistor cell region includes a plurality of trenches disposed in the semiconductor substrate, a well region between the plurality of trenches, and a source region of a MOSFET in the well region. A source electrode of the MOSFET is in contact with a top surface of the source region in each of the plurality of transistor cell regions. The source electrode is in contact with a part of a main surface of the semiconductor substrate so as to form a Schottky junction in a Schottky cell region disposed between the plurality of transistor cell regions. The Schottky junction is lower than a portion of the main surface between the Schottky junction and one of the transistor cell regions.
Public/Granted literature
- US20130214378A1 SEMICONDUCTOR DEVICE INCLUDING A MOSFET AND SCHOTTKY JUNCTION Public/Granted day:2013-08-22
Information query
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