Invention Grant
- Patent Title: Method and apparatus for controlling film deposition
- Patent Title (中): 用于控制膜沉积的方法和装置
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Application No.: US13778072Application Date: 2013-02-26
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Publication No.: US08962073B2Publication Date: 2015-02-24
- Inventor: Vladimir Bulovic , Jianglong Chen , Conor F. Madigan , Martin A. Schmidt
- Applicant: Massachusetts Institute of Technology
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Main IPC: B05D1/12
- IPC: B05D1/12 ; B05D1/26 ; B41J2/045 ; B05B17/00 ; B41J2/14 ; B41J2/07 ; H05B33/10 ; H01L51/00 ; H01L51/56

Abstract:
The disclosure relates to a method for depositing films on a substrate which may form part of an LED or other types of display. In one embodiment, the disclosure relates to an apparatus for depositing ink on a substrate. The apparatus includes a chamber for receiving ink; a discharge nozzle having an inlet port and an outlet port, the discharge nozzle receiving a quantity of ink from the chamber at the inlet port and dispensing the quantity of ink from the outlet port; and a dispenser for metering the quantity of ink from the chamber to the inlet port of the discharge nozzle; wherein the chamber receives ink in liquid form having a plurality of suspended particles and the quantity of ink is pulsatingly metered from the chamber to the discharge nozzle; and the discharge nozzle evaporates the carrier liquid and deposits the solid particles on the substrate.
Public/Granted literature
- US20140063094A1 METHOD AND APPARATUS FOR CONTROLLING FILM DEPOSITION Public/Granted day:2014-03-06
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