发明授权
US08968536B2 Sputtering target having increased life and sputtering uniformity 有权
溅射靶材寿命延长和溅射均匀性

Sputtering target having increased life and sputtering uniformity
摘要:
A sputtering target for a sputtering chamber comprises a backing plate with a sputtering plate mounted thereon. In one version, the backing plate comprises a circular plate having a front surface comprising an annular groove. The sputtering plate comprises a disk comprising a sputtering surface and a backside surface having a circular ridge that is shaped and sized to fit into the annular groove of the backing plate.
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