发明授权
US08993376B2 Semiconductor device and method of forming wafer-level multi-row etched leadframe with base leads and embedded semiconductor die 有权
用基极引线和嵌入式半导体芯片形成晶圆级多行蚀刻引线框的半导体器件和方法

Semiconductor device and method of forming wafer-level multi-row etched leadframe with base leads and embedded semiconductor die
摘要:
A semiconductor device has a base substrate with first and second opposing surfaces. A plurality of cavities and base leads between the cavities is formed in the first surface of the base substrate. The first set of base leads can have a different height or similar height as the second set of base leads. A concave capture pad can be formed over the second set of base leads. Alternatively, a plurality of openings can be formed in the base substrate and the semiconductor die mounted to the openings. A semiconductor die is mounted between a first set of the base leads and over a second set of the base leads. An encapsulant is deposited over the die and base substrate. A portion of the second surface of the base substrate is removed to separate the base leads. An interconnect structure is formed over the encapsulant and base leads.
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