发明授权
- 专利标题: Cap metal forming method
- 专利标题(中): 盖金属成型方法
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申请号: US12405468申请日: 2009-03-17
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公开(公告)号: US08999432B2公开(公告)日: 2015-04-07
- 发明人: Takashi Tanaka , Yusuke Saito , Mitsuaki Iwashita
- 申请人: Takashi Tanaka , Yusuke Saito , Mitsuaki Iwashita
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Pearne & Gordon LLP
- 优先权: JP2008-233528 20080911
- 主分类号: B05D5/12
- IPC分类号: B05D5/12 ; B05C11/00 ; B05B13/04 ; B05C5/00 ; C23C18/38 ; C23C18/16
摘要:
A cap metal forming method capable of obtaining a uniform film thickness on the entire surface of a substrate is provided. A method for forming a cap metal on a processing surface of a substrate provided with two or more regions having different water-repellent properties, includes: holding the substrate horizontally by a rotatable holding mechanism installed in an inner chamber; supplying a gas between the inner chamber and an outer chamber covering the inner chamber via a gas supply hole provided in a top surface of the outer chamber; forming a pressure gradient between the inner chamber and the outer chamber; and supplying a plating solution to a preset position on the processing surface of the substrate after a pressure of the gas inside the inner chamber reaches a preset value so as to form the cap metal on at least one of the regions.
公开/授权文献
- US20100062159A1 CAP METAL FORMING METHOD 公开/授权日:2010-03-11