Invention Grant
- Patent Title: Treatment system for removing halogenated compounds from contaminated sources
- Patent Title (中): 污染源除去卤化物的处理系统
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Application No.: US13895717Application Date: 2013-05-16
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Publication No.: US09011789B2Publication Date: 2015-04-21
- Inventor: Jacqueline W. Quinn , Christian A. Clausen , Cherie L. Yestrebsky
- Applicant: The United States of America as Represented by the Administrator of the National Aeronautics and Space Administration
- Applicant Address: US DC Washington
- Assignee: The United States of America as Represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee: The United States of America as Represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee Address: US DC Washington
- Agent Michelle L. Ford; Jennifer P. Yancy
- Main IPC: B01J8/02
- IPC: B01J8/02 ; B01D11/04 ; C02F1/28 ; A62D3/34 ; B01D71/24 ; B01D71/42 ; B09C1/02 ; B09C1/08 ; C02F1/44 ; A62D3/37 ; C02F1/26 ; C02F101/36 ; C02F103/00 ; C02F103/06

Abstract:
A treatment system and a method for removal of at least one halogenated compound, such as PCBs, found in contaminated systems are provided. The treatment system includes a polymer blanket for receiving at least one non-polar solvent. The halogenated compound permeates into or through a wall of the polymer blanket where it is solubilized with at least one non-polar solvent received by said polymer blanket forming a halogenated solvent mixture. This treatment system and method provides for the in situ removal of halogenated compounds from the contaminated system. In one embodiment, the halogenated solvent mixture is subjected to subsequent processes which destroy and/or degrade the halogenated compound.
Public/Granted literature
- US20140155676A1 Treatment System and Method for Removing Halogenated Compounds from Contaminated Systems Public/Granted day:2014-06-05
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