发明授权
- 专利标题： Stage apparatus and process apparatus
- 专利标题（中）： 舞台装置和处理装置
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申请号： US13428530申请日： 2012-03-23
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公开(公告)号： US09021983B2公开(公告)日： 2015-05-05
- 发明人: Ryoichi Inanami , Shinichi Ito , Hiroshi Koizumi , Akihiro Kojima
- 申请人： Ryoichi Inanami , Shinichi Ito , Hiroshi Koizumi , Akihiro Kojima
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权： JP2011-156005 20110714
- 主分类号： B05C11/00
- IPC分类号： B05C11/00 ; C23C16/00 ; H01L21/76 ; H01L21/687 ; H01L21/67 ; H01L21/683
摘要：
According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
公开/授权文献
- US20130014360A1 STAGE APPARATUS AND PROCESS APPARATUS 公开/授权日：2013-01-17
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