Invention Grant
US09076906B2 Hetero-junction bipolar phototransistor with improved noise characteristic
有权
具有改善噪声特性的异质结双极光电晶体管
- Patent Title: Hetero-junction bipolar phototransistor with improved noise characteristic
- Patent Title (中): 具有改善噪声特性的异质结双极光电晶体管
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Application No.: US13138410Application Date: 2010-02-12
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Publication No.: US09076906B2Publication Date: 2015-07-07
- Inventor: Mutsuo Ogura , SungWoo Choi , Nobuyuki Hayama , Katsuhiko Nishida
- Applicant: Mutsuo Ogura , SungWoo Choi , Nobuyuki Hayama , Katsuhiko Nishida
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2009-031235 20090213; JP2009-031236 20090213
- International Application: PCT/JP2010/052485 WO 20100212
- International Announcement: WO2010/093058 WO 20100819
- Main IPC: H01L31/102
- IPC: H01L31/102 ; H01L31/0304 ; H01L31/11

Abstract:
A hetero-junction bipolar phototransistor includes a photo-absorption layer formed of a first conductivity type semiconductor layer, and a collector operating as a barrier layer, a base layer, and an emitter layer, which are stacked in sequence on the photo-absorption layer. The photo-absorption layer, collector, base layer and emitter layer forms a first mesa structure, and an emitter contact layer forms a second mesa structure. The photo-absorption layer includes a semiconductor layer with a narrow gap corresponding to a light-sensing wavelength of the phototransistor. The collector includes a semiconductor layer with a wider gap than a gap of the photo-absorption layer. The base layer has an energy level equal to or higher than the energy level of the collector. The emitter layer has a wide gap as compared to the base layer, and an energy level in a valence band is lower than an energy level of the base layer.
Public/Granted literature
- US20110291158A1 HETERO-JUNCTION BIPOLAR PHOTOTRANSISTOR Public/Granted day:2011-12-01
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