Invention Grant
- Patent Title: Method for forming deposition film, and method for producing display device
- Patent Title (中): 沉积膜形成方法及显示装置的制造方法
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Application No.: US13976422Application Date: 2011-12-20
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Publication No.: US09076989B2Publication Date: 2015-07-07
- Inventor: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2010-291202 20101227
- International Application: PCT/JP2011/079439 WO 20111220
- International Announcement: WO2012/090770 WO 20120705
- Main IPC: H01L51/56
- IPC: H01L51/56 ; H05B33/04 ; H05B33/10 ; H01L21/02 ; H01L51/00 ; C23C14/04 ; C23C16/04 ; H01L27/32
Abstract:
A masking film (13) is formed so as to have an opening in a display region (R1) (luminescent region) and a sealing region. Subsequently, luminescent layers (8R, 8G, and 8B) having a stripe pattern are formed. Then, the masking film (13) is peeled off, so that the luminescent layers (8R, 8G, and 8B) patterned with high resolution are provided.
Public/Granted literature
- US20130295705A1 METHOD FOR FORMING DEPOSITION FILM, AND METHOD FOR PRODUCING DISPLAY DEVICE Public/Granted day:2013-11-07
Information query
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