Invention Grant
- Patent Title: Metrology systems and methods
- Patent Title (中): 计量系统和方法
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Application No.: US14516540Application Date: 2014-10-16
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Publication No.: US09080971B2Publication Date: 2015-07-14
- Inventor: Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corp.
- Current Assignee: KLA-Tencor Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/47
- IPC: G01N21/47 ; G01B11/02 ; G03F7/20 ; G01N21/956 ; G01N21/95 ; G01B11/06 ; G01N21/21

Abstract:
Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Public/Granted literature
- US20150036142A1 Metrology Systems and Methods Public/Granted day:2015-02-05
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