Invention Grant
US09082800B2 Substrate treatment system, substrate transfer method and non-transitory computer-readable storage medium
有权
底物处理系统,底物转移方法和非暂时性计算机可读存储介质
- Patent Title: Substrate treatment system, substrate transfer method and non-transitory computer-readable storage medium
- Patent Title (中): 底物处理系统,底物转移方法和非暂时性计算机可读存储介质
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Application No.: US13623189Application Date: 2012-09-20
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Publication No.: US09082800B2Publication Date: 2015-07-14
- Inventor: Suguru Enokida , Masahiro Nakaharada , Hidekazu Kiyama , Naruaki Iida , Akira Miyata
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2011-207463 20110922; JP2011-207466 20110922
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67 ; H01L21/687

Abstract:
A substrate treatment system comprise a treatment station having a plurality of treatment units provided at multiple tiers in an up-down direction, a cassette mounting table on which a cassette housing a plurality of wafers W is mounted, and a wafer transfer mechanism arranged between the treatment station and the cassette mounting table, wherein a delivery block in which a plurality of delivery units are provided at multiple tiers is provided between the treatment station and the wafer transfer mechanism, the delivery units temporarily housing a wafer to be transferred between the cassette mounting table and the treatment station and a wafer to be transferred between the tiers of the treatment units. The wafer transfer mechanism includes a first transfer arm that transfers a wafer between the cassette mounting table and the delivery block, and a second transfer arm that transfers a wafer between the tiers of the delivery units.
Public/Granted literature
Information query
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