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1.发明授权公开(公告)号：US10042356B2
公开(公告)日：2018-08-07
申请号：US14625201
申请日：2015-02-18
Applicant: TOKYO ELECTRON LIMITED
Inventor： Naruaki Iida , Katsuhiro Morikawa
IPC: H01L21/677 , G05B19/418 , H01L21/687 , H01L21/68
Abstract: A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.
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公开(公告)号：US09818654B2
公开(公告)日：2017-11-14
申请号：US15171240
申请日：2016-06-02
Applicant: Tokyo Electron Limited
Inventor： Masato Hayashi , Kohei Noguchi , Kenji Iizuka , Naruaki Iida
IPC: H01L21/027 , H01L21/66 , H01L21/67 , G01N21/85 , G03F7/16
CPC classification number: H01L22/10 , G01N21/85 , G01N2021/8578 , G03F7/16 , G03F7/162 , H01L21/0273 , H01L21/67253
Abstract: An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receiving element. Consequently, the number of necessary light irradiating units can be reduced, and the apparatus can be miniaturized.
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公开(公告)号：US08707805B2
公开(公告)日：2014-04-29
申请号：US13716659
申请日：2012-12-17
Applicant: Tokyo Electron Limited
Inventor： Junnosuke Maki , Mitsuteru Yano , Seiji Nakano , Tsuyoshi Watanabe , Yasunori Toyoda , Suguru Enokida , Naruaki Iida , Hiroki Harada
CPC classification number: G06F17/00 , B25J13/085 , H01L21/67288 , H01L21/68707
Abstract: A transfer apparatus for mounting and transferring a transferred component on a driven means, the transfer apparatus includes: a driving means for rotating a driving side pulley by a rotational driving force of a motor to move a belt wound around the driving side pulley, thereby moving the driven means coupled to the belt in a predetermined direction; and a transfer monitoring means for monitoring a transfer state of the driven means, wherein the transfer monitoring means detects a torque value of the motor required to move the driven means, calculates a torque differential value of the torque value with respect to time based on the detected torque value, and detects the transfer state using the calculated torque differential value.
Abstract translation: 一种用于在被驱动装置上安装和传送传送部件的传送装置，所述传送装置包括：驱动装置，用于通过电动机的旋转驱动力旋转驱动侧滑轮，以使缠绕在驱动侧滑轮周围的皮带移动，从而移动 所述被驱动装置沿预定方向联接到所述带; 以及传送监视装置，用于监视被驱动装置的传送状态，其中转印监视装置检测移动被驱动装置所需的电动机的转矩值，基于时间计算转矩值相对于时间的转矩差值 检测转矩值，并使用计算出的转矩差分值来检测转印状态。
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公开(公告)号：US12151255B2
公开(公告)日：2024-11-26
申请号：US18218457
申请日：2023-07-05
Applicant: TOKYO ELECTRON LIMITED
Inventor： Hideki Kajiwara , Yuya Yonemitsu , Shinichiro Yamanaka , Shinichi Mizushino , Naruaki Iida , Kohei Kawakami , Tohru Azuma
Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.
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公开(公告)号：US11752515B2
公开(公告)日：2023-09-12
申请号：US16897922
申请日：2020-06-10
Applicant: TOKYO ELECTRON LIMITED
Inventor： Hideki Kajiwara , Yuya Yonemitsu , Shinichiro Yamanaka , Shinichi Mizushino , Naruaki Iida , Kohei Kawakami , Tohru Azuma
Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.
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Patent Agency Ranking
6.发明授权公开(公告)号：US09299599B2
公开(公告)日：2016-03-29
申请号：US14248765
申请日：2014-04-09
Applicant: TOKYO ELECTRON LIMITED
Inventor： Yuichi Douki , Tokutarou Hayashi , Naruaki Iida , Suguru Enokida
IPC: H01L21/00 , H05B3/68 , C23C16/00 , H01L21/68 , H01L21/67 , H01L21/677 , H01L21/687 , H01L21/66
CPC classification number: H01L21/68 , H01L21/6715 , H01L21/67748 , H01L21/681 , H01L21/68707 , H01L22/10 , H01L2924/0002 , H01L2924/00
Abstract: A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.
Abstract translation: 一种能够在不使用任何定位夹具的情况下定位基板支架的基板支架定位方法，包括：测量保持在基板承载机构中的基板保持器上的基板的第一位置; 将保持在所述基板保持器上的所述基板承载到用于保持和旋转所述基板的基板旋转单元; 通过基板旋转单元将由基板旋转单元保持的基板转动预定角度; 将由基板旋转单元转动的基板从基板旋转单元传送到基板保持器; 测量从所述基板旋转单元转移到所述基板保持器的所述基板的第二位置; 基于第一位置和第二位置确定基板旋转单元的旋转中心的位置; 并且基于旋转中心的位置来定位衬底保持器。
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公开(公告)号：US20130166064A1
公开(公告)日：2013-06-27
申请号：US13716659
申请日：2012-12-17
Applicant: Tokyo Electron Limited
Inventor： Junnosuke Maki , Mitsuteru Yano , Seiji Nakano , Tsuyoshi Watanabe , Yasunori Toyoda , Suguru Enokida , Naruaki Iida , Hiroki Harada
IPC: G06F17/00
CPC classification number: G06F17/00 , B25J13/085 , H01L21/67288 , H01L21/68707
Abstract: A transfer apparatus for mounting and transferring a transferred component on a driven means, the transfer apparatus includes: a driving means for rotating a driving side pulley by a rotational driving force of a motor to move a belt wound around the driving side pulley, thereby moving the driven means coupled to the belt in a predetermined direction; and a transfer monitoring means for monitoring a transfer state of the driven means, wherein the transfer monitoring means detects a torque value of the motor required to move the driven means, calculates a torque differential value of the torque value with respect to time based on the detected torque value, and detects the transfer state using the calculated torque differential value.
Abstract translation: 一种用于在被驱动装置上安装和传送传送部件的传送装置，所述传送装置包括：驱动装置，用于通过电动机的旋转驱动力旋转驱动侧滑轮，以使缠绕在驱动侧滑轮周围的皮带移动，从而移动 所述被驱动装置沿预定方向联接到所述带; 以及传送监视装置，用于监视被驱动装置的传送状态，其中转印监视装置检测移动被驱动装置所需的电动机的转矩值，基于时间计算转矩值相对于时间的转矩差值 检测转矩值，并使用计算出的转矩差分值来检测转印状态。
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公开(公告)号：US11978655B2
公开(公告)日：2024-05-07
申请号：US18201270
申请日：2023-05-24
Applicant: Tokyo Electron Limited
Inventor： Kousei Ide , Naruaki Iida
IPC: H01L21/677 , B65G47/90 , H01L21/67 , H01L21/687
CPC classification number: H01L21/68707 , B65G47/90 , H01L21/67178 , H01L21/67712
Abstract: A substrate transfer mechanism includes: an arm base main body provided with a first driver; a lift configured to move up and down the arm base main body; a first arm extending transversely from a lower side of the arm base main body, and having a tip end that pivots around a vertical axis with respect to the arm base main body by the first driver; a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm; and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.
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9.发明授权Substrate treatment system, substrate transfer method and non-transitory computer-readable storage medium 有权底物处理系统，底物转移方法和非暂时性计算机可读存储介质公开(公告)号：US09082800B2
公开(公告)日：2015-07-14
申请号：US13623189
申请日：2012-09-20
Applicant: Tokyo Electron Limited
Inventor： Suguru Enokida , Masahiro Nakaharada , Hidekazu Kiyama , Naruaki Iida , Akira Miyata
IPC: H01L21/677 , H01L21/67 , H01L21/687
CPC classification number: H01L21/67766 , H01L21/67155 , H01L21/67178 , H01L21/67769 , H01L21/68707
Abstract: A substrate treatment system comprise a treatment station having a plurality of treatment units provided at multiple tiers in an up-down direction, a cassette mounting table on which a cassette housing a plurality of wafers W is mounted, and a wafer transfer mechanism arranged between the treatment station and the cassette mounting table, wherein a delivery block in which a plurality of delivery units are provided at multiple tiers is provided between the treatment station and the wafer transfer mechanism, the delivery units temporarily housing a wafer to be transferred between the cassette mounting table and the treatment station and a wafer to be transferred between the tiers of the treatment units. The wafer transfer mechanism includes a first transfer arm that transfers a wafer between the cassette mounting table and the delivery block, and a second transfer arm that transfers a wafer between the tiers of the delivery units.
Abstract translation: 基板处理系统包括处理台，该处理台具有设置在上下方向的多层的多个处理单元，安装有多个晶片W的盒子的盒安装台，以及布置在 处理台和盒安装台，其中在处理站和晶片传送机构之间设置有多个传送单元设置在多层的传送块，传送单元暂时容纳要在盒安装件 桌子和治疗台以及待处理单元层之间转移的晶片。 晶片传送机构包括在盒安装台和传送块之间传送晶片的第一传送臂和在传送单元的各层之间传送晶片的第二传送臂。
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公开(公告)号：US10795265B2
公开(公告)日：2020-10-06
申请号：US16521052
申请日：2019-07-24
Applicant: TOKYO ELECTRON LIMITED
Inventor： Norihisa Koga , Yoshitaka Konishi , Naruaki Iida , Yuzo Ohishi , Kazuhiro Takeshita
Abstract: There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.
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