发明授权
- 专利标题： Substrate processing apparatus including shielding unit for suppressing leakage of magnetic field
- 专利标题（中）： 基板处理装置，包括用于抑制磁场泄漏的屏蔽单元
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申请号： US13034035申请日： 2011-02-24
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公开(公告)号： US09084298B2公开(公告)日： 2015-07-14
- 发明人: Yukitomo Hirochi , Akinori Tanaka , Akihiro Sato , Takeshi Itoh , Daisuke Hara , Kenji Shirako , Kazuhiro Morimitsu , Masanao Fukuda
- 申请人： Yukitomo Hirochi , Akinori Tanaka , Akihiro Sato , Takeshi Itoh , Daisuke Hara , Kenji Shirako , Kazuhiro Morimitsu , Masanao Fukuda
- 申请人地址： JP Tokyo
- 专利权人： Hitachi Kokusai Electric Inc.
- 当前专利权人： Hitachi Kokusai Electric Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Volpe and Koenig, P.C.
- 优先权： JP2010-042818 20100226; JP2010-067196 20100324
- 主分类号： H05B6/10
- IPC分类号： H05B6/10 ; H05B6/02
摘要：
There are provided a substrate processing apparatus capable of suppressing leakage of magnetic field during processing of a substrate. The substrate processing apparatus of the present invention includes: a reaction tube having a processing chamber provided therein to process a substrate; an induction heating unit installed outside of the reaction tube to accommodate the reaction tube, wherein the induction heating unit is configured to electromagnetically induction-heat the processing chamber by generating a magnetic field; an accommodation tube installed outside of the induction heating unit to accommodate the induction heating unit, wherein the accommodation tube accommodates the reaction tube and the induction heating unit in an air-tight manner; a shielding unit made of a conductive material installed to surround an outside of the accommodation tube; and an inert gas supply unit installed in a gap between the reaction tube and the accommodation tube where the induction heating unit is installed, wherein the inert gas supply unit is configured to supply an inert gas into the gap.