发明授权
- 专利标题： Method of forming pattern and developer for use in the method
- 专利标题（中）： 形成图案和显影剂的方法用于该方法
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申请号： US13172273申请日： 2011-06-29
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公开(公告)号： US09097973B2公开(公告)日： 2015-08-04
- 发明人: Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Kaoru Iwato , Keita Kato , Kana Fujii
- 申请人： Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Kaoru Iwato , Keita Kato , Kana Fujii
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2010-150180 20100630; JP2011-135554 20110617
- 主分类号： G03F7/42
- IPC分类号： G03F7/42 ; G03F7/039 ; G03F7/038 ; G03F7/32 ; G03F7/004 ; G03F7/20
摘要：
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
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