发明授权
- 专利标题: Crystalline silicon formation apparatus
- 专利标题(中): 结晶硅形成装置
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申请号: US12637403申请日: 2009-12-14
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公开(公告)号: US09109301B2公开(公告)日: 2015-08-18
- 发明人: Chung-Wen Lan , Kimsam Hsieh , Wen-Huai Yu , Bruce Hsu , Ya-Lu Tsai , Wen-Ching Hsu , Suz-Hua Ho
- 申请人: Chung-Wen Lan , Kimsam Hsieh , Wen-Huai Yu , Bruce Hsu , Ya-Lu Tsai , Wen-Ching Hsu , Suz-Hua Ho
- 申请人地址: TW Hsinchu
- 专利权人: Sino-American Silicon Products, Inc.
- 当前专利权人: Sino-American Silicon Products, Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Osha Liang LLP
- 主分类号: C30B11/02
- IPC分类号: C30B11/02 ; C30B11/14 ; C30B28/06 ; C30B29/06
摘要:
In a crystalline silicon formation apparatus, a quick cooling method is applied to the bottom of a crucible to control a growth orientation of a polycrystalline silicon grain, such that the crystal grain forms twin boundary, and the twin boundary is a symmetric grain boundary, and the crystal grain is solidified and grown upward in unidirection to form a complete polycrystalline silicon, such that defects or impurities will not form in the polycrystalline silicon easily.
公开/授权文献
- US20110142730A1 Crystalline Silicon Formation Apparatus 公开/授权日:2011-06-16
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