Invention Grant
- Patent Title: Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
- Patent Title (中): 辐射敏感性树脂组合物和辐射敏感性酸产生剂
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Application No.: US13937048Application Date: 2013-07-08
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Publication No.: US09122154B2Publication Date: 2015-09-01
- Inventor: Ken Maruyama
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-002627 20110111; JP2011-213584 20110928
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C309/06 ; C08K5/42 ; C07C309/12 ; C07C381/12 ; C07D493/08 ; G03F7/039 ; G03F7/20
Abstract:
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).
Public/Granted literature
- US20140154625A9 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT Public/Granted day:2014-06-05
Information query
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