公开(公告)号：US09122154B2

公开(公告)日：2015-09-01

申请号：US13937048

申请日：2013-07-08

Applicant: JSR CORPORATION

Inventor： Ken Maruyama

IPC: G03F7/004 ,  C07C309/06 ,  C08K5/42 ,  C07C309/12 ,  C07C381/12 ,  C07D493/08 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C381/12 ,  C07D493/08 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  C08L101/00

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).

Abstract translation: 辐射敏感性树脂组合物包含由式（1）表示的化合物和基础聚合物。 式（1）中，R 1表示由式（a1）表示的基团，M +表示放射线降解性一价阳离子。 式（a1）中，R 2表示取代或未取代的碳原子数1〜30的链状烃基等。 R3表示取代或未取代的碳原子数1〜30的二价烃基等。 R 41表示-CO-等。 R 42表示-CO-等。 m为0〜2的整数.n为0〜1的整数。*表示的位置是式（1）中的-O-的结合位点。

公开(公告)号：US08889336B2

公开(公告)日：2014-11-18

申请号：US13905170

申请日：2013-05-30

Applicant: JSR Corporation

Inventor： Ken Maruyama

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  C07C309/01 ,  C07C309/06 ,  G03F7/027 ,  G03F7/029 ,  C08F220/10 ,  C08K5/42 ,  C08L33/04 ,  G03F7/20

CPC classification number: G03F7/027 ,  C07C309/06 ,  C08F220/10 ,  C08K5/42 ,  C08L33/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/029 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126 ,  C08F220/18 ,  C08F220/22 ,  C08F220/20

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.

Abstract translation: 辐射敏感性树脂组合物包含由式（1）表示的化合物和基础聚合物。 A表示-CO-或-CH2-。 R1表示碳原子数1〜30的烃基，环原子数3〜30的杂环基或第一基和第二基的组合。 第一组为-CO-，-COO-，-OCO-，-O-CO-O-，-NHCO-，-CONH-，-NH-CO-O-，-O-CO-NH-，-NH - ， - S - ， - SO - ， - SO 2 - ， - SO 2 -O-或其组合，第二组是具有1至30个碳原子的烃基，具有3至30个环原子的杂环基或 的组合。 包含在烃基和杂环基中的部分或全部氢原子不被取代或取代。 M +表示一价阳离子。

公开(公告)号：US11966161B2

公开(公告)日：2024-04-23

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro Taniguchi ,  Katsuaki Nishikori ,  Hayato Namai ,  Kazuya Kiriyama ,  Ken Maruyama

IPC: G03F7/004 ,  C07C303/32 ,  C07C381/12 ,  C08G75/20 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C381/12 ,  C08G75/20 ,  G03F7/0392 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US11609495B2

公开(公告)日：2023-03-21

申请号：US17081000

申请日：2020-10-27

Applicant: JSR CORPORATION

Inventor： Katsuaki Nishikori ,  Kazuya Kiriyama ,  Takuhiro Taniguchi ,  Ken Maruyama

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US09128370B2

公开(公告)日：2015-09-08

申请号：US13759118

申请日：2013-02-05

Applicant: JSR Corporation

Inventor： Ken Maruyama

IPC: G03F7/004 ,  C07C309/06 ,  C07C309/25 ,  G03C1/73 ,  C07C25/18 ,  C07C381/12 ,  C07D307/93 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03C1/73 ,  C07C25/18 ,  C07C309/06 ,  C07C309/25 ,  C07C381/12 ,  C07C2601/04 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/18 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each R0 independently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. R1 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. R2 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rf represents a fluoromethylene group or a divalent fluoroalkylene group. M+ represents a monovalent onium cation. Optionally R1 bonds to Rf or R2 to form a cyclic structure.

Abstract translation: 辐射敏感性组合物包括由通式（1）表示的光酸产生剂和溶剂。 每个R 10独立地表示氢原子，氟原子或取代或未取代的一价有机基团。 R1表示氟原子或取代或未取代的一价有机基团。 R 2表示氟原子或取代或未取代的一价有机基团。 Rf表示氟亚甲基或二氟氟代亚烷基。 M +表示单价鎓阳离子。 任选地，R 1与R f或R 2键合形成环状结构。

公开(公告)号：US08889335B2

公开(公告)日：2014-11-18

申请号：US13789742

申请日：2013-03-08

Applicant: JSR Corporation

Inventor： Ken Maruyama

IPC: G03F7/039 ,  G03F7/11 ,  G03F7/004 ,  G03F7/033 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/033 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/126

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.

Abstract translation: 辐射敏感性树脂组合物包括由式（1）表示的化合物和用作基础树脂的聚合物。 R1是包含-CO-，-NH-，-S-和-SO2-的至少两个基团的一价基团，所述至少两个基团各自相同或不同。 A为二价烃基或碳原子数为1〜5的二价氟代烃基。 R是氟原子或氢原子。 a是从1到4的整数。在存在多个R的情况下，多个R中的每一个都是相同的或不同的。 M +是一价阳离子。

公开(公告)号：US08809476B2

公开(公告)日：2014-08-19

申请号：US13659026

申请日：2012-10-24

Applicant: JSR Corporation

Inventor： Ken Maruyama ,  Toshiyuki Kai

IPC: C08F220/18 ,  G03F7/004 ,  G03F7/039 ,  C08F220/30

CPC classification number: G03F7/0397 ,  C08F8/12 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F220/18 ,  C08F220/30 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F2220/1891

Abstract: A polymer includes a repeating unit shown by a following general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.

Abstract translation: 聚合物包括由以下通式（1）表示的重复单元。 R1表示氢原子，甲基，氟原子或三氟甲基。 R2表示取代或未取代的碳原子数6〜22的芳基。 Y表示碳原子。 X表示与Y一起形成脂环族烃基的原子团。

公开(公告)号：US11592746B2

公开(公告)日：2023-02-28

申请号：US16815075

申请日：2020-03-11

Applicant: JSR CORPORATION

Inventor： Kazuya Kiriyama ,  Katsuaki Nishikori ,  Takuhiro Taniguchi ,  Ken Maruyama

IPC: C07C309/06 ,  G03F7/039 ,  G03F7/004 ,  C08L25/06 ,  C08L33/06 ,  C07C309/12

Abstract: A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

公开(公告)号：US20230027151A1

公开(公告)日：2023-01-26

申请号：US17847228

申请日：2022-06-23

Applicant: JSR CORPORATION

Inventor： Ryo KUMEGAWA ,  Sosuke Osawa ,  Miki Tamada ,  Ken Maruyama ,  Motohiro Shiratani

IPC: B05D1/32 ,  C08J5/18

Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

公开(公告)号：US20200012194A1

公开(公告)日：2020-01-09

申请号：US16445267

申请日：2019-06-19

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI ,  Natsuko Kinoshita ,  Ken Maruyama

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  C08L33/14 ,  C08L25/18

Abstract: Provided are a radiation-sensitive resin composition, a resist pattern-forming method and a polymer component. The radiation-sensitive resin composition contains: a polymer component having a first structural unit that includes a phenolic hydroxyl group and a second structural unit that includes an acid-labile group; and a radiation-sensitive acid generator, wherein, the polymer component satisfies inequality (A), wherein, in the inequality (A), X1 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component included in a fraction eluted until a retention time at which a cumulative area accounts for 1% of a total area on a gel permeation chromatography (GPC) elution curve of the polymer component detected by a differential refractometer; and X2 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component. X1