Invention Grant
US09123663B2 Semiconductor device and method of forming shielding layer grounded through metal pillars formed in peripheral region of the semiconductor 有权
半导体器件和形成在半导体的周边区域中形成的通过金属柱接地的屏蔽层的方法

Semiconductor device and method of forming shielding layer grounded through metal pillars formed in peripheral region of the semiconductor
Abstract:
A shielded semiconductor device is made by mounting semiconductor die to a first substrate. An encapsulant is formed over the semiconductor die and first substrate. A dicing channel is formed through the encapsulant between the semiconductor die. A hole is drilled in the first substrate along the dicing channel on each side of the semiconductor die. A shielding layer is formed over the encapsulant and semiconductor die. The hole is lined with the shielding layer. The first substrate is singulated to separate the semiconductor die. The first substrate is mounted to a second substrate. A metal pillar is formed in the opening to electrically connect the shielding layer to a ground plane in the second substrate. The metal pillar includes a hook for a mechanically secure connection to the shielding layer. An interconnect structure is formed on the first substrate to electrically connect the semiconductor die to the second substrate.
Information query
Patent Agency Ranking
0/0