Invention Grant
- Patent Title: Base material for forming single crystal diamond film and method for producing single crystal diamond using the same
- Patent Title (中): 用于形成单晶金刚石膜的基材和使用其制造单晶金刚石的方法
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Application No.: US12591539Application Date: 2009-11-23
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Publication No.: US09127375B2Publication Date: 2015-09-08
- Inventor: Hitoshi Noguchi
- Applicant: Hitoshi Noguchi
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2009-003102 20090109
- Main IPC: C30B29/04
- IPC: C30B29/04 ; C30B25/18

Abstract:
The present invention is a base material for forming a single crystal diamond comprising, at least, a seed base material of a single crystal and a thin film heteroepitaxially grown on the seed base material, wherein the seed base material is a single crystal diamond and the thin film is Iridium film or Rhodium film. As a result, there is provided a base material for forming a single crystal diamond that enables a single crystal diamond having a high crystallinity to be heteroepitaxially grown thereon and that can be reused repeatedly and a method for producing a single crystal diamond that enables a single crystal diamond having a high crystallinity and a large area to be produced at low cost.
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