Invention Grant
US09127375B2 Base material for forming single crystal diamond film and method for producing single crystal diamond using the same 有权
用于形成单晶金刚石膜的基材和使用其制造单晶金刚石的方法

Base material for forming single crystal diamond film and method for producing single crystal diamond using the same
Abstract:
The present invention is a base material for forming a single crystal diamond comprising, at least, a seed base material of a single crystal and a thin film heteroepitaxially grown on the seed base material, wherein the seed base material is a single crystal diamond and the thin film is Iridium film or Rhodium film. As a result, there is provided a base material for forming a single crystal diamond that enables a single crystal diamond having a high crystallinity to be heteroepitaxially grown thereon and that can be reused repeatedly and a method for producing a single crystal diamond that enables a single crystal diamond having a high crystallinity and a large area to be produced at low cost.
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