Invention Grant
- Patent Title: Graphene deposition and graphenated substrates
- Patent Title (中): 石墨烯沉积和石墨化底物
-
Application No.: US13920814Application Date: 2013-06-18
-
Publication No.: US09129803B2Publication Date: 2015-09-08
- Inventor: Haim Grebel , Amrita Banerjee
- Applicant: NEW JERSEY INSTITUTE OF TECHNOLOGY
- Applicant Address: US NJ Newark
- Assignee: NEW JERSEY INSTITUTE OF TECHNOLOGY
- Current Assignee: NEW JERSEY INSTITUTE OF TECHNOLOGY
- Current Assignee Address: US NJ Newark
- Agency: Jensen & Puntigam, PS
- Main IPC: H01L21/332
- IPC: H01L21/332 ; H01L21/02 ; H01L29/16 ; H01L29/66 ; H01L29/786 ; H01L29/778

Abstract:
Methods, devices, systems and/or articles related to techniques for forming a graphene film on a substrate, and the resulting graphene layers and graphenated substrates are generally disclosed. Some example techniques may be embodied as methods or processes for forming graphene. Some other example techniques may be embodied as devices employed to manipulate, treat, or otherwise process substrates, graphite, graphene and/or graphenated substrates as described herein. Graphene layers and graphenated substrates produced by the various techniques and devices provided herein are also disclosed.
Public/Granted literature
- US20130280829A1 GRAPHENE DEPOSITION AND GRAPHENATED SUBSTRATES Public/Granted day:2013-10-24
Information query
IPC分类: