Invention Grant
US09134469B2 Composite for black matrix resist, method for manufacturing black matrix resist, color filter array panel, and method for manufacturing the same
有权
用于黑矩阵抗蚀剂的复合材料，黑矩阵抗蚀剂的制造方法，滤色器阵列面板及其制造方法
- Patent Title: Composite for black matrix resist, method for manufacturing black matrix resist, color filter array panel, and method for manufacturing the same
- Patent Title (中): 用于黑矩阵抗蚀剂的复合材料，黑矩阵抗蚀剂的制造方法，滤色器阵列面板及其制造方法
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Application No.: US14065594Application Date: 2013-10-29
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Publication No.: US09134469B2Publication Date: 2015-09-15
- Inventor: Woo Sub Shim , Sung Woong Kim , Jang Sub Kim , Yoon Ho Kang
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2011-0011526 20110209
- Main IPC: H01B1/04
- IPC: H01B1/04 ; C01B31/00 ; C01B7/00 ; C01B33/02 ; G02B5/22 ; G02B5/20 ; B82Y30/00 ; C09D183/08
Abstract:
A resist composition for a black matrix, the resist composition including carbon nanotubes, a halosulfonic acid, an alcohol, an ammonium hydroxide compound, and a fluorosilane.
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