Invention Grant
- Patent Title: Method of measuring a silicon thin film, method of detecting defects in a silicon thin film, and silicon thin film defect detection device
- Patent Title (中): 测量硅薄膜的方法,硅薄膜中的缺陷检测方法以及硅薄膜缺陷检测装置
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Application No.: US13766271Application Date: 2013-02-13
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Publication No.: US09140742B2Publication Date: 2015-09-22
- Inventor: Alexander Voronov , Seok-Ho Lee , Ji-Hunny Jung , Kyung-Hoe Heo , Gyoo-Wan Han
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: KR10-2012-0036843 20120409
- Main IPC: G01R31/02
- IPC: G01R31/02 ; G01R31/26 ; G01R31/265

Abstract:
A method of measuring conductivity of a silicon thin film is provided. By the method, a capacitive sensor is positioned over a silicon thin film sample with an air-gap between the sensor and the sample, a size of the air-gap is measured using the capacitive sensor while an excitation light source module is turned off, an excitation light is illuminated on the silicon thin film sample by turning on the excitation light source module, where the excitation light is an ultraviolet light, a conductivity change of the silicon thin film sample is measured using the capacitive sensor, and a measurement error due to a deviation of the air-gap is eliminated by normalizing the conductivity change based on a measurement result of the size of the air-gap.
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