Invention Grant
US09153649B2 Semiconductor device and method for evaluating semiconductor device
有权
半导体装置及半导体装置的评价方法
- Patent Title: Semiconductor device and method for evaluating semiconductor device
- Patent Title (中): 半导体装置及半导体装置的评价方法
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Application No.: US14091907Application Date: 2013-11-27
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Publication No.: US09153649B2Publication Date: 2015-10-06
- Inventor: Toshinari Sasaki , Hiroshi Kanemura , Yasuharu Hosaka , Shuhei Yokoyama , Toshimitsu Obonai
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP2012-263819 20121130
- Main IPC: G01R31/02
- IPC: G01R31/02 ; H01L29/22 ; H01L29/786 ; H01L27/146 ; G09G3/00 ; G09G3/32 ; G09G3/36 ; G01R31/265

Abstract:
A semiconductor layer with a low density of trap states is provided. A transistor with stable electrical characteristics is provided. A transistor having high field-effect mobility is provided. A semiconductor device including the transistor is provided. A method for evaluating a semiconductor layer is provided. A method for evaluating a transistor is provided. A method for evaluating a semiconductor device is provided. Provided is, for example, a semiconductor layer with a low defect density which can be used for a channel formation region of a transistor, a transistor including a semiconductor layer with a low defect density in a channel formation region, or a semiconductor device including the transistor.
Public/Granted literature
- US20140152336A1 Semiconductor Device and Method for Evaluating Semiconductor Device Public/Granted day:2014-06-05
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