Invention Grant
- Patent Title: Target for extreme ultraviolet light source
- Patent Title (中): 瞄准极紫外光源
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Application No.: US14550421Application Date: 2014-11-21
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Publication No.: US09155179B2Publication Date: 2015-10-06
- Inventor: Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G21K5/04 ; G21K5/08 ; H01S3/10 ; G21K5/02

Abstract:
Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Public/Granted literature
- US20150076374A1 TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2015-03-19
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