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公开(公告)号：US09380691B2
公开(公告)日：2016-06-28
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J. W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US20150076374A1
公开(公告)日：2015-03-19
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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Patent Agency Ranking
公开(公告)号：US20160165709A1
公开(公告)日：2016-06-09
申请号：US14562237
申请日：2014-12-05
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Daniel J. Golich , Michael Kats , John T. Stewart , Rostislav Rokitski
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0064 , H01S3/0085 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005 , H05G2/006
Abstract: A method and apparatus for protecting the seed laser a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. An isolation stage positioned on an optical path diverts light reflected from further components in the LPP EUV light system from reaching the seed laser. The isolation stage comprises two AOMs that are separated by a delay line. The AOMs, when open, direct light onto the optical path and, when closed, direct light away from the optical path. The delay introduced by the delay line is determined so that the opening and the closing of the AOMs can be timed to direct a forward-moving pulse onto the optical path and to divert reflected light at other times. The isolation stage can be positioned between gain elements to prevent amplified reflected light from reaching the seed laser and other potentially harmful effects.
Abstract translation: 公开了一种用于保护激光产生等离子体（LPP）极紫外（EUV）光系统的种子激光器的方法和装置。 位于光路上的隔离级将从LPP EUV光系统中的其它部件反射的光转移到种子激光器。 隔离级包括由延迟线分开的两个AOM。 AOM在打开时将光线引导到光路上，并且在关闭时将光引导离开光路。 确定由延迟线引入的延迟，使得可以定时将AOM的打开和关闭定时以将向前移动的脉冲引导到光路上并在其它时间转移反射光。 隔离级可以位于增益元件之间，以防止放大的反射光到达种子激光器和其他潜在的有害影响。
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公开(公告)号：US20150250045A1
公开(公告)日：2015-09-03
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J.W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US09155179B2
公开(公告)日：2015-10-06
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US20140299791A1
公开(公告)日：2014-10-09
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US08912514B2
公开(公告)日：2014-12-16
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
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