Invention Grant
- Patent Title: Masking mechanism for film forming apparatus
- Patent Title (中): 成膜装置的遮蔽机构
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Application No.: US12652340Application Date: 2010-01-05
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Publication No.: US09157144B2Publication Date: 2015-10-13
- Inventor: Hideomi Koinuma , Yukio Yamamoto , Yuji Matsumoto , Ryota Takahashi
- Applicant: Hideomi Koinuma , Yukio Yamamoto , Yuji Matsumoto , Ryota Takahashi
- Applicant Address: JP Saitama
- Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee Address: JP Saitama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2002-275365 20020920
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C14/04

Abstract:
It comprises a mask (11) having a first, a second and a third action edge (11a, 11b, 11c), and a drive means for moving the mask (11) relative to a substrate (12) in a uniaxial direction (A) whereby moving the mask at a fixed rate of movement to cause the edges to successively act on an identical substrate region while successively applying different materials thereto forms thin films of three components successively with respective film thickness gradients oriented in three different directions mutually angularly spaced apart by an angle of 120° to allow these films to overlap, thereby forming a ternary phase diagrammatic thin film 13.
Public/Granted literature
- US20100151128A1 MASKING MECHANISM FOR FILM FORMING APPARATUS Public/Granted day:2010-06-17
Information query
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