摘要:
It comprises a mask (11) having a first, a second and a third action edge (11a, 11b, 11c), and a drive means for moving the mask (11) relative to a substrate (12) in a uniaxial direction (A) whereby moving the mask at a fixed rate of movement to cause the edges to successively act on an identical substrate region while successively applying different materials thereto forms thin films of three components successively with respective film thickness gradients oriented in three different directions mutually angularly spaced apart by an angle of 120° to allow these films to overlap, thereby forming a ternary phase diagrammatic thin film 13.
摘要:
It comprises a mask (11) having a first, a second and a third action edge (11a, 11b, 11c), and a drive means for moving the mask (11) relative to a substrate (12) in a uniaxial direction (A) whereby moving the mask at a fixed rate of movement to cause the edges to successively act on an identical substrate region while successively applying different materials thereto forms thin films of three components successively with respective film thickness gradients oriented in three different directions mutually angularly spaced apart by an angle of 120° to allow these films to overlap, thereby forming a ternary phase diagrammatic thin film 13.
摘要:
It comprises a mask (11) having a first, a second and a third action edge (11a, 11b, 11c), and a drive means for moving the mask (11) relative to a substrate (12) in a uniaxial direction (A) whereby moving the mask at a fixed rate of movement to cause the edges to successively act on an identical substrate region while successively applying different materials thereto forms thin films of three components successively with respective film thickness gradients oriented in three different directions mutually angularly spaced apart by an angle of 120° to allow these films to overlap, thereby forming a ternary phase diagrammatic thin film 13.
摘要:
A flux assisted solid phase epitaxy that can make a thin film having a crystalline perfection comparable with that of a bulk crystal and at a reduced cost is provided in which an amorphous film of a mixture of an objective substance to be grown epitaxially and a flux of a substance producing a eutectic with the objective substance but not producing any compound therewith is deposited on a substrate at a temperature less than a eutectic point of the substances, and the substrate is heat-treated at a temperature not less than the eutectic point of the objective and flux substances. A solid phase reaction, namely solid phase diffusion causes the objective and flux substances to be mixed together to form a liquid phase in their eutectic state from which the objective substance precipitates and epitaxially grows on the substrate.
摘要:
A flux assisted solid phase epitaxy that can make a thin film having a crystalline perfection comparable with that of a bulk crystal and at a reduced cost is provided in which an amorphous film of a mixture of an objective substance to be grown epitaxially and a flux of a substance producing a eutectic with the objective substance but not producing any compound therewith is deposited on a substrate at a temperature less than a eutectic point of the substances, and the substrate is heat-treated at a temperature not less than the eutectic point of the objective and flux substances. A solid phase reaction, namely solid phase diffusion causes the objective and flux substances to be mixed together to form a liquid phase in their eutectic state from which the objective substance precipitates and epitaxially grows on the substrate.
摘要:
A Bi4Ti3O12 nanoplate, an array of such Bi4Ti3O12 nanoplate and their making methods as well as their applications are provided. Using a vapor phase growth method, a flux layer of VOx is deposited on a SrTiO3 (001) faced substrate and then Bi4Ti3O12 is deposited on the flux layer. A Bi4Ti3O12 single crystal nanoplate is formed standing up on the flux layer in the form of a rectangular solid whose independent three sides are crystallographically oriented in directions coincident with particular crystallographic directions of the single crystal substrate, respectively. The nanoplates as a nanostructure grown by the bottom-up method are substantially fixed in shape and are densely arrayed not in contact with one another, and are applicable to a low-cost ferroelectric memory and the like.
摘要:
A Bi4Ti3O12 nanoplate, an array of such Bi4Ti3O12 nanoplate and their making methods as well as their applications are provided. Using a vapor phase growth method, a flux layer of VOx is deposited on a SrTiO3 (001) faced substrate and then Bi4Ti3O12 is deposited on the flux layer. A Bi4Ti3O12 single crystal nanoplate is formed standing up on the flux layer in the form of a rectangular solid whose independent three sides are crystallographically oriented in directions coincident with particular crystallographic directions of the single crystal substrate, respectively. The nanoplates as a nanostructure grown by the bottom-up method are substantially fixed in shape and are densely arrayed not in contact with one another, and are applicable to a low-cost ferroelectric memory and the like.
摘要:
The present invention provides methods for producing a multi-element oxide single crystal which contains Bi, which has high crystallinity independently of a preparation process, and which is represented by the formula (Bi2O2)Am−1BmO3m+1, wherein A is Sr, Ba, Ca, or Bi and B is Ti, Ta, or Nb.A flux layer, containing a composition satisfying the inequality 0
摘要翻译:本发明提供了制备含有Bi的多元素氧化物单晶的方法,该Bi具有独立于制备方法的高结晶度,并且由式(Π2 O 2) 其中A是Sr,Ba,Ca或Bi和B,其中A是Sr,Ba,Ca或Bi和B 是Ti,Ta或Nb。 包含满足不等式0的组成的通量层,和/或0 <= TIO / BI2 SUB 以摩尔为基础沉积在基片上,然后将单晶薄膜沉积在放置在晶片上的助熔剂层上。 制备含有原料和助熔剂并且满足上述不等式的组合物的熔体,并且将熔体冷却以使单晶生长。 将CuO助熔剂层沉积在晶片上,并且使用Bi 6 Ti 3 O 12 12将Bi-Ti-O供应到焊剂层。 ,Bi 7,Ti 3 O 12,或Bi 8 Ti 3 O 2, 其中Bi含量大于目标薄膜的Bi含量,使得Bi 4 N 3 O 12 O / 12 >晶片上方形成单晶薄膜。
摘要:
The present invention provides methods for producing a multi-element oxide single crystal which contains Bi, which has high crystallinity independently of a preparation process, and which is represented by the formula (Bi2O2)Am-1BmO3m+1, wherein A is Sr, Ba, Ca, or Bi and B is Ti, Ta, or Nb. A flux layer, containing a composition satisfying the inequality 0
摘要翻译:本发明提供了制备含有Bi的多元素氧化物单晶的方法,该Bi具有独立于制备方法的高结晶度,并且由式(Π2 O 2) 其中A是Sr,Ba,Ca或Bi和B,其中A是Sr,Ba,Ca或Bi和B 是Ti,Ta或Nb。 包含满足不等式0的组成的通量层,和/或0 <= TIO / BI2 SUB 以摩尔为基础沉积在基片上,然后将单晶薄膜沉积在放置在晶片上的助熔剂层上。 制备含有原料和助熔剂并且满足上述不等式的组合物的熔体,并且将熔体冷却以使单晶生长。 将CuO助熔剂层沉积在晶片上,并且使用Bi 6 Ti 3 O 12 12将Bi-Ti-O供应到焊剂层。 ,Bi 7,Ti 3 O 12,或Bi 8 Ti 3 O 2, 其中Bi含量大于目标薄膜的Bi含量,使得Bi 4 N 3 O 12 O / 12 >晶片上方形成单晶薄膜。
摘要:
The invention relates to a printing method by an offset printing press and an offset printing press by which a substrate process is carried out for low-whiteness printing paper such as paper for newspaper with aqueous substrate treatment agent so that the print quality can be improved. In the invention, in order to suppress occurrence of a curl of printing paper, substrate treatment agent containing solid fine particles and a binder component is supplied to a printing face of printing paper, and the substrate treatment agent is dried to form a porous layer having a great number of holes having a smaller diameter than that of pigment contained in printing ink from the solid fine particles and the binder resin. Then, offset printing is carried out on the printing paper.