发明授权
- 专利标题： Coating and development treatment system with airflow control including control unit and movable airflow control plate
- 专利标题（中）： 涂装开发处理系统，包括控制单元和可移动气流控制板
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申请号： US13448526申请日： 2012-04-17
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公开(公告)号： US09162247B2公开(公告)日： 2015-10-20
- 发明人: Kousuke Yoshihara , Koji Takayanagi , Shinichi Hatakeyama , Kohei Kawakami
- 申请人： Kousuke Yoshihara , Koji Takayanagi , Shinichi Hatakeyama , Kohei Kawakami
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Posz Law Group, PLC
- 优先权： JP2011-098684 20110426; JP2012-049740 20120306
- 主分类号： B05C11/00
- IPC分类号： B05C11/00 ; B05C13/02 ; B05C5/00 ; B05C11/02 ; B05D1/00 ; H01L21/67 ; G03F7/16 ; B05D3/12 ; H01L21/00 ; H01L51/00
摘要：
A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.
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