Invention Grant
- Patent Title: Photosensitive composition and photoresist
- Patent Title (中): 感光组合物和光致抗蚀剂
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Application No.: US14141091Application Date: 2013-12-26
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Publication No.: US09170490B2Publication Date: 2015-10-27
- Inventor: Hsien-Kuang Lin , Sue-May Chen , Jauder Jeng , Yu-Lin Liu , Su-Huey Chen
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW102130229A 20130823
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/033 ; C08L33/00

Abstract:
A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition includes a binder agent, a first photomonomer, and a photo initiator. The first photomonomer has at least a lactic oligomer and at least two unsaturated acrylic functional groups, wherein the first photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photoinitiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.
Public/Granted literature
- US20150056556A1 PHOTOSENSITIVE COMPOSITION AND PHOTORESIST Public/Granted day:2015-02-26
Information query
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