公开(公告)号：US11753502B2

公开(公告)日：2023-09-12

申请号：US17578080

申请日：2022-01-18

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chi-Fu Tseng ,  Jauder Jeng ,  Tien-Shou Shieh ,  Chin-Hui Chou

IPC: C08L79/08 ,  C08G63/78

CPC classification number: C08G63/78 ,  C08G2115/00

Abstract: An oligomer is formed by reacting a diacid monomer with (a) epoxy resin or (b) glycidyl methacrylate, wherein the diacid monomer has a chemical structure of




wherein X is —O—,





and each R1 is independently CH3, CH2F, CHF2, or CF3. A composition containing the oligomer can be cured to serve as a sealant of an optoelectronic device, and the sealant can be lifted off by a laser beam irradiation.

公开(公告)号：US20130137042A1

公开(公告)日：2013-05-30

申请号：US13741450

申请日：2013-01-15

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Hsien-Kuang Lin ,  Jauder Jeng ,  Sue-May Chen ,  Te-Yi Chang ,  Tsung-Yi Chou

IPC: G03F7/004

CPC classification number: G03F7/004 ,  G03F7/028 ,  G03F7/032 ,  G03F7/033

Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent has a chemical structure comprising following repeating unit: R1 is H or CH3, n is 2-40 of integer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solide content of the binder agent.

Abstract translation: 提供感光组合物和光致抗蚀剂。 光致抗蚀剂通过配合感光组合物形成。 光敏组合物包含粘合剂，光单体和光引发剂。 粘合剂具有包含以下重复单元的化学结构：R 1为H或CH 3，n为整数2-40。 相对于100重量份的粘合剂的固体含量，所述光单体具有约25-95重量份的量。 光引发剂相对于100重量份粘合剂的固化剂含量为约0.5-15重量份。

公开(公告)号：US09081275B2

公开(公告)日：2015-07-14

申请号：US13741450

申请日：2013-01-15

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Hsien-Kuang Lin ,  Jauder Jeng ,  Sue-May Chen ,  Te-Yi Chang ,  Tsung-Yi Chou

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/032 ,  G03F7/033

CPC classification number: G03F7/004 ,  G03F7/028 ,  G03F7/032 ,  G03F7/033

Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent has a chemical structure comprising following repeating unit: R1 is H or CH3, n is 2-40 of integer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.

Abstract translation: 提供感光组合物和光致抗蚀剂。 光致抗蚀剂通过配合感光组合物形成。 光敏组合物包含粘合剂，光单体和光引发剂。 粘合剂具有包含以下重复单元的化学结构：R 1为H或CH 3，n为整数2-40。 相对于100重量份的粘合剂的固体含量，所述光单体具有约25-95重量份的量。 光引发剂相对于100重量份粘合剂的固体含量为约0.5-15重量份。

公开(公告)号：US11845883B2

公开(公告)日：2023-12-19

申请号：US17830698

申请日：2022-06-02

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Jauder Jeng ,  Hsien-Kuang Lin ,  Ming-Hsueh Chiang ,  Tien-Shou Shieh ,  Chi-Fu Tseng

IPC: C09J133/08 ,  C09J7/29 ,  C09J133/10 ,  C09J133/20 ,  C09J133/26 ,  C09J139/06 ,  B32B37/12 ,  C09J7/38 ,  B32B17/10

CPC classification number: C09J133/08 ,  B32B17/10458 ,  B32B37/1284 ,  C09J7/29 ,  C09J7/38 ,  C09J133/10 ,  C09J133/20 ,  C09J133/26 ,  C09J139/06 ,  B32B2307/412 ,  B32B2307/42 ,  B32B2457/202 ,  B32B2551/00 ,  C09J2203/318 ,  C09J2301/124 ,  Y10T428/2848 ,  Y10T428/2891

Abstract: A double-sided optically clear adhesive is provided. The double-sided optically clear adhesive includes a first adhesive layer and a second adhesive layer. The first adhesive layer includes a first resin and a first thermal-crosslinking agent. The first resin includes a hydroxyl group. The first thermal-crosslinking agent includes a first group. The second adhesive layer includes a second resin and a second thermal-crosslinking agent. The second resin includes a hydroxyl group. The second thermal-crosslinking agent includes a second group. The ratio of the equivalent number of the first group of the first thermal-crosslinking agent to the equivalent number of the hydroxyl group of the first resin is represented by r1. The ratio of the equivalent number of the second group of the second thermal-crosslinking agent to the equivalent number of the hydroxyl group of the second resin is represented by r2, wherein r1

公开(公告)号：US09170490B2

公开(公告)日：2015-10-27

申请号：US14141091

申请日：2013-12-26

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Hsien-Kuang Lin ,  Sue-May Chen ,  Jauder Jeng ,  Yu-Lin Liu ,  Su-Huey Chen

IPC: G03F7/004 ,  G03F7/033 ,  C08L33/00

CPC classification number: G03F7/033 ,  C08L33/00 ,  G03F7/027 ,  G03F7/031

Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition includes a binder agent, a first photomonomer, and a photo initiator. The first photomonomer has at least a lactic oligomer and at least two unsaturated acrylic functional groups, wherein the first photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photoinitiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.

Abstract translation: 提供感光组合物和光致抗蚀剂。 光致抗蚀剂通过配合感光组合物形成。 光敏组合物包括粘合剂，第一光单体和光引发剂。 第一单体单体具有至少一种乳酸低聚物和至少两种不饱和丙烯酸官能团，其中第一单体单体相对于100重量份固体含量的粘合剂为约25-95重量份。 相对于100重量份的粘合剂的固体含量，光引发剂的量为约0.5-15重量份。