发明授权
US09174235B2 Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines
有权
使用具有平行处理线的水平处理电池装置的基板处理装置
- 专利标题： Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines
- 专利标题（中）： 使用具有平行处理线的水平处理电池装置的基板处理装置
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申请号： US13401625申请日： 2012-02-21
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公开(公告)号： US09174235B2公开(公告)日： 2015-11-03
- 发明人: Yoshiteru Fukutomi , Tsuyoshi Mitsuhashi , Hiroyuki Ogura , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
- 申请人： Yoshiteru Fukutomi , Tsuyoshi Mitsuhashi , Hiroyuki Ogura , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
- 申请人地址： JP Kyoto
- 专利权人： Screen Semiconductor Solutions Co., Ltd.
- 当前专利权人： Screen Semiconductor Solutions Co., Ltd.
- 当前专利权人地址： JP Kyoto
- 代理机构： Kilpatrick Townsend & Stockton LLP
- 优先权： JP2007-172496 20070629
- 主分类号： B05C13/00
- IPC分类号： B05C13/00 ; H01L21/67 ; B05D3/04 ; B05B15/12
摘要：
A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism disposed in a transporting space for transporting the substrates to the treating units. The treating units include solution treating units and heat-treating units. The solution treating units are arranged at one side of the transporting space, the heat-treating units are arranged at the other side of the transporting space, and the main transport mechanism and the treating units are in substantially the same layout in plan view for the respective cells. The solution treating units are in substantially the same layout in side view for the respective cells, the heat-treating units are in substantially the same layout in side view for the respective cells, and treatments of the substrates carried out in the respective cells are the same.
公开/授权文献
- US20120145073A1 SUBSTRATE TREATING APPARATUS 公开/授权日：2012-06-14
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