发明授权
US09182674B2 Immersion upper layer film forming composition and method of forming photoresist pattern
有权
浸渍上层成膜组合物和形成光致抗蚀剂图案的方法
- 专利标题： Immersion upper layer film forming composition and method of forming photoresist pattern
- 专利标题（中）： 浸渍上层成膜组合物和形成光致抗蚀剂图案的方法
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申请号： US13550733申请日： 2012-07-17
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公开(公告)号： US09182674B2公开(公告)日： 2015-11-10
- 发明人: Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
- 申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
- 申请人地址： JP Tokyo
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2004-008466 20040115; JP2004-185706 20040624; JP2004-233463 20040810
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; G03F7/20 ; C08F214/18 ; C08F216/10 ; C08F220/18 ; C08F220/24
摘要：
An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.
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