Invention Grant
- Patent Title: Photoresist compositions and methods of forming photolithographic patterns
- Patent Title (中): 光刻胶组合物和形成光刻图案的方法
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Application No.: US13149573Application Date: 2011-05-31
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Publication No.: US09188864B2Publication Date: 2015-11-17
- Inventor: Young Cheol Bae , Deyan Wang , Thomas Cardolaccia , Seokho Kang , Rosemary Bell
- Applicant: Young Cheol Bae , Deyan Wang , Thomas Cardolaccia , Seokho Kang , Rosemary Bell
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/40 ; G03F7/039 ; H01L21/027 ; G03F7/11 ; G03F7/20 ; G03F7/32 ; C08F220/28
Abstract:
Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US20110294069A1 PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS Public/Granted day:2011-12-01
Information query
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