Invention Grant
- Patent Title: Flip-chip light emitting diode and fabrication method
- Patent Title (中): 倒装芯片发光二极管及其制作方法
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Application No.: US14583185Application Date: 2014-12-25
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Publication No.: US09190569B2Publication Date: 2015-11-17
- Inventor: Xiaoqiang Zeng , Shunping Chen , Qunfeng Pan , Shaohua Huang
- Applicant: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: Xiamen Sanan Optoelectronics Technology Co., Ltd.
- Current Assignee: Xiamen Sanan Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma
- Main IPC: H01L29/18
- IPC: H01L29/18 ; H01L33/20 ; H01L33/14 ; H01L33/62 ; H01L27/15 ; H01L33/00 ; H01L33/36 ; H01L33/38

Abstract:
A flip-chip light emitting diode (LED) includes: a substrate having a P-type pad electrode and an N-type pad electrode; a light-emitting epitaxial layer flip-chip mounted over the substrate, including, from top down, an n-type semiconductor layer, an active layer, and a p-type semiconductor layer. The n-type semiconductor layer is divided into a light-emitting region, an isolation region, and an electrode region. The light-emitting region and the electrode region are electrically isolated by the isolation region. The active layer and the p-type semiconductor layer are below the light-emitting region. The p-type semiconductor layer connects with the P-type pad electrode. The electrode region of the n-type semiconductor layer connects with the N-type pad electrode. A conductive connection portion on the n-type semiconductor layer connects the electrode region of the n-type semiconductor layer and the light-emitting region, realizing vertical current injection into the light-emitting epitaxial layer when an external power is connected.
Public/Granted literature
- US20150115295A1 Flip-Chip Light Emitting Diode and Fabrication Method Public/Granted day:2015-04-30
Information query
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