Invention Grant
US09196352B2 Static random access memory unit cell structure and static random access memory unit cell layout structure
有权
静态随机存取单元单元格结构和静态随机存取单元布局结构
- Patent Title: Static random access memory unit cell structure and static random access memory unit cell layout structure
- Patent Title (中): 静态随机存取单元单元格结构和静态随机存取单元布局结构
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Application No.: US13776589Application Date: 2013-02-25
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Publication No.: US09196352B2Publication Date: 2015-11-24
- Inventor: Ching-Wen Hung , Po-Chao Tsao , Shu-Ru Wang , Chia-Wei Huang , Chieh-Te Chen , Feng-Yi Chang , Chih-Sen Huang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: H01L21/70
- IPC: H01L21/70 ; G11C11/00 ; G11C11/412 ; H01L27/02 ; H01L27/11

Abstract:
A static random access memory unit cell layout structure is disclosed, in which a slot contact is disposed on one active area and another one across from the one. A static random access memory unit cell structure and a method of fabricating the same are also disclosed, in which, a slot contact is disposed on drains of a pull-up transistor and a pull-down transistor, and a metal-zero interconnect is disposed on the slot contact and a gate line of another pull-up transistor. Accordingly, there is not an intersection of vertical and horizontal metal-zero interconnects, and there is no place suffering from twice etching. Leakage junction due to stitch recess can be avoided.
Public/Granted literature
Information query
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