发明授权
US09202657B1 Fully integrated and encapsulated micro-fabricated vacuum diode and method of manufacturing same 有权
完全集成和封装的微制造真空二极管及其制造方法

  • 专利标题: Fully integrated and encapsulated micro-fabricated vacuum diode and method of manufacturing same
  • 专利标题(中): 完全集成和封装的微制造真空二极管及其制造方法
  • 申请号: US14340012
    申请日: 2014-07-24
  • 公开(公告)号: US09202657B1
    公开(公告)日: 2015-12-01
  • 发明人: Paul J. ResnickEric Langlois
  • 申请人: Sandia Corporation
  • 申请人地址: US NM Albuquerque
  • 专利权人: Sandia Corporation
  • 当前专利权人: Sandia Corporation
  • 当前专利权人地址: US NM Albuquerque
  • 代理商 Helen S. Baca
  • 主分类号: H01J9/04
  • IPC分类号: H01J9/04 H01J3/02 H01J1/308 H01J1/304
Fully integrated and encapsulated micro-fabricated vacuum diode and method of manufacturing same
摘要:
Disclosed is an encapsulated micro-diode and a method for producing same. The method comprises forming a plurality columns in the substrate with a respective tip disposed at a first end of the column, the tip defining a cathode of the diode; disposing a sacrificial oxide layer on the substrate, plurality of columns and respective tips; forming respective trenches in the sacrificial oxide layer around the columns; forming an opening in the sacrificial oxide layer to expose a portion of the tips; depositing a conductive material in of the opening and on a surface of the substrate to form an anode of the diode; and removing the sacrificial oxide layer.
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