Invention Grant
US09206511B2 Method and system for supplying a cleaning gas into a process chamber
有权
用于将清洁气体供应到处理室中的方法和系统
- Patent Title: Method and system for supplying a cleaning gas into a process chamber
- Patent Title (中): 用于将清洁气体供应到处理室中的方法和系统
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Application No.: US14087671Application Date: 2013-11-22
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Publication No.: US09206511B2Publication Date: 2015-12-08
- Inventor: Ramprakash Sankarakrishnan , Dale R. Du Bois , Ganesh Balasubramanian , Karthik Janakiraman , Juan Carlos Rocha-Alvarez , Thomas Nowak , Visweswaren Sivaramakrishnan , Hichem M'Saad
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/44 ; F16K31/08 ; B08B5/00 ; C23C16/455 ; B08B7/00 ; F16K31/06
Abstract:
A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.
Public/Granted literature
- US20140076236A1 METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER Public/Granted day:2014-03-20
Information query
IPC分类:
