Invention Grant
US09223221B2 Photoresist stripping and cleaning composition, method of its preparation and its use
有权
光刻胶剥离和清洗组合物，其制备方法及其用途
- Patent Title: Photoresist stripping and cleaning composition, method of its preparation and its use
- Patent Title (中): 光刻胶剥离和清洗组合物，其制备方法及其用途
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Application No.: US14381039Application Date: 2013-03-18
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Publication No.: US09223221B2Publication Date: 2015-12-29
- Inventor: Simon Braun , Christian Bittner , Andreas Klipp
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/IB2013/052141 WO 20130318
- International Announcement: WO2013/136318 WO 20130919
- Main IPC: H01L21/461
- IPC: H01L21/461 ; G03F7/42 ; H01L21/311 ; C11D7/50 ; C11D11/00 ; H01L21/02 ; H01L21/027 ; H01L21/265 ; H01L21/266 ; H01L29/16 ; H01L29/161 ; H01L29/66
Abstract:
A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol.
Public/Granted literature
- US20150044839A1 PHOTORESIST STRIPPING AND CLEANING COMPOSITION, METHOD OF ITS PREPARATION AND ITS USE Public/Granted day:2015-02-12
Information query
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