Invention Grant
- Patent Title: Rule generating apparatus and method using lithography simulation
- Patent Title (中): 使用光刻模拟的规则生成装置和方法
-
Application No.: US14533553Application Date: 2014-11-05
-
Publication No.: US09230053B2Publication Date: 2016-01-05
- Inventor: Hyun-Jong Lee , Chul-Hong Park , Roo-Li Choi , Duck-Hyung Hur
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2014-0016158 20140212
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L21/027
Abstract:
A design rule generating method is provided. The method includes receiving a test pattern, providing a plurality of workflows, which correspond to the test pattern and are preset in relation to a lithography model and a mask generation method, and performing simulation on the test pattern according to a workflow selected from the workflows.
Public/Granted literature
- US20150227673A1 DESIGN RULE GENERATING APPARATUS AND METHOD USING LITHOGRAPHY SIMULATION Public/Granted day:2015-08-13
Information query
