公开(公告)号：US20150227673A1

公开(公告)日：2015-08-13

申请号：US14533553

申请日：2014-11-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun-Jong Lee ,  Chul-Hong Park ,  Roo-Li Choi ,  Duck-Hyung Hur

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/36 ,  G03F1/70 ,  H01L21/027

Abstract: A design rule generating method is provided. The method includes receiving a test pattern, providing a plurality of workflows, which correspond to the test pattern and are preset in relation to a lithography model and a mask generation method, and performing simulation on the test pattern according to a workflow selected from the workflows.

Abstract translation: 提供了一种设计规则生成方法。 该方法包括接收测试图案，提供对应于测试图案并相对于光刻模型和掩模生成方法预设的多个工作流程，以及根据从工作流程中选择的工作流程在测试图案上执行模拟 。

公开(公告)号：US09230053B2

公开(公告)日：2016-01-05

申请号：US14533553

申请日：2014-11-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun-Jong Lee ,  Chul-Hong Park ,  Roo-Li Choi ,  Duck-Hyung Hur

IPC: G06F17/50 ,  H01L21/027

CPC classification number: G06F17/5081 ,  G03F1/36 ,  G03F1/70 ,  H01L21/027

Abstract: A design rule generating method is provided. The method includes receiving a test pattern, providing a plurality of workflows, which correspond to the test pattern and are preset in relation to a lithography model and a mask generation method, and performing simulation on the test pattern according to a workflow selected from the workflows.

Abstract translation: 提供了一种设计规则生成方法。 该方法包括接收测试图案，提供对应于测试图案并相对于光刻模型和掩模生成方法预设的多个工作流程，以及根据从工作流程中选择的工作流程在测试图案上执行模拟 。