Invention Grant
US09240469B2 Transverse ultra-thin insulated gate bipolar transistor having high current density
有权
具有高电流密度的横向超薄绝缘栅双极晶体管
- Patent Title: Transverse ultra-thin insulated gate bipolar transistor having high current density
- Patent Title (中): 具有高电流密度的横向超薄绝缘栅双极晶体管
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Application No.: US14439715Application Date: 2012-12-27
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Publication No.: US09240469B2Publication Date: 2016-01-19
- Inventor: Weifeng Sun , Jing Zhu , Shen Xu , Qinsong Qian , Siyang Liu , Shengli Lu , Longxing Shi
- Applicant: SOUTHEAST UNIVERSITY
- Applicant Address: CN Jiangu
- Assignee: SOUTHEAST UNIVERSITY
- Current Assignee: SOUTHEAST UNIVERSITY
- Current Assignee Address: CN Jiangu
- Agency: Troutman Sanders LLP
- Agent James E. Schutz; Lei Fang
- Priority: CN201210442085 20121107
- International Application: PCT/CN2012/087710 WO 20121227
- International Announcement: WO2014/071673 WO 20140515
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/739 ; H01L29/06 ; H01L29/49 ; H01L29/10 ; H01L29/08 ; H01L23/528

Abstract:
A transverse ultra-thin insulated gate bipolar transistor having current density includes: a P substrate, where the P substrate is provided with a buried oxide layer thereon, the buried oxide layer is provided with an N epitaxial layer thereon, the N epitaxial layer is provided with an N well region and P base region therein, the P base region is provided with a first P contact region and an N source region therein, the N well region is provided with an N buffer region therein, the N well region is provided with a field oxide layer thereon, the N buffer region is provided with a P drain region therein, the N epitaxial layer is provided therein with a P base region array including a P annular base region, the P base region array is located between the N well region and the P base region, the P annular base region is provided with a second P contact region and an N annular source region therein, and the second P contact region is located in the N annular source region. The present invention greatly increases current density of a transverse ultra-thin insulated gate bipolar transistor, thus significantly improving the performance of an intelligent power module.
Public/Granted literature
- US20150270377A1 TRANSVERSE ULTRA-THIN INSULATED GATE BIPOLAR TRANSISTOR HAVING HIGH CURRENT DENSITY Public/Granted day:2015-09-24
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