Invention Grant
- Patent Title: Vacuum treatment apparatus and a method for manufacturing
- Patent Title (中): 真空处理装置及其制造方法
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Application No.: US13997801Application Date: 2011-12-27
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Publication No.: US09252037B2Publication Date: 2016-02-02
- Inventor: Bart Scholte Von Mast , Wolfgang Rietzler , Rogier Lodder , Rolf Bazlen , Daniel Rohrer
- Applicant: Bart Scholte Von Mast , Wolfgang Rietzler , Rogier Lodder , Rolf Bazlen , Daniel Rohrer
- Applicant Address: LI Balzers
- Assignee: Oerlikon Advanced Technologies AG
- Current Assignee: Oerlikon Advanced Technologies AG
- Current Assignee Address: LI Balzers
- Agency: Notaro, Michalos & Zaccaria P.C.
- International Application: PCT/EP2011/074094 WO 20111227
- International Announcement: WO2012/089732 WO 20120705
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67

Abstract:
A vacuum treatment apparatus and method for manufacturing has a plurality of treatment chambers for treating workpieces, in particular silicon wafers, a transfer chamber attached to the treatment chambers communicating via respective openings and having handling zones located adjacent to each of the treatment chambers. A workpiece carrier is arranged within the transfer chamber and configured to transfer the workpieces between the handling zones, and one or more handlers for moving the workpieces between the handling zones and the treatment chambers. The transfer chamber is ring-shaped about an axis and the openings have opening substantially parallel thereto. This way, forces on the transfer chamber are redirected to a large support structure and thus, a cost-effective, light and still rigid mechanical construction can be achieved.
Public/Granted literature
- US20130287527A1 VACUUM TREATMENT APPARATUS AND A METHOD FOR MANUFACTURING Public/Granted day:2013-10-31
Information query
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