公开(公告)号：US09396981B2

公开(公告)日：2016-07-19

申请号：US13976314

申请日：2011-12-27

Applicant: Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

Inventor： Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

IPC: H01L21/677 ,  H01L21/67

CPC classification number: C23C16/458 ,  C23C14/50 ,  C23C14/541 ,  C23C16/4412 ,  C23C16/52 ,  F04B45/02 ,  H01J37/32724 ,  H01J37/32834 ,  H01J2237/3321 ,  H01L21/6719 ,  H01L21/67703 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/6776

Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber the vacuum treatment chamber is split into a workpiece treatment compartment and a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows a pumping port to have a flow cross-section area that is freely selectable independently from the geometry of the treatment compartment.

Abstract translation: 为了减少由传送装置在传送室中所服务的真空处理室的抽吸时间，真空处理室被分成相互自由流动连通的工件处理室和泵室，并相对于运动路径 用于真空处理室的运输装置。 泵送室允许泵送端口具有可独立于治疗隔室的几何形状自由选择的流动横截面区域。

公开(公告)号：US20140086711A1

公开(公告)日：2014-03-27

申请号：US13976314

申请日：2011-12-27

Applicant: Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

Inventor： Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

IPC: H01L21/677

CPC classification number: C23C16/458 ,  C23C14/50 ,  C23C14/541 ,  C23C16/4412 ,  C23C16/52 ,  F04B45/02 ,  H01J37/32724 ,  H01J37/32834 ,  H01J2237/3321 ,  H01L21/6719 ,  H01L21/67703 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/6776

Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber the vacuum treatment chamber is split into a workpiece treatment compartment and a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows a pumping port to have a flow cross-section area that is freely selectable independently from the geometry of the treatment compartment.

Abstract translation: 为了减少由传送装置在传送室中所服务的真空处理室的抽吸时间，真空处理室被分成相互自由流动连通的工件处理室和泵室，并相对于运动路径 用于真空处理室的运输装置。 泵送室允许泵送端口具有可独立于治疗隔室的几何形状自由选择的流动横截面区域。

公开(公告)号：US07519230B2

公开(公告)日：2009-04-14

申请号：US10542893

申请日：2003-12-16

Applicant: Rimmert B. Wittebrood ,  Gerard De Haan ,  Rogier Lodder

Inventor： Rimmert B. Wittebrood ,  Gerard De Haan ,  Rogier Lodder

IPC: G06K9/36

CPC classification number: H04N5/145 ,  H04N7/014

Abstract: A selector (502) for selecting a background motion vector for a pixel in an occlusion region of an image, from a set of motion vectors being computed for the image, comprises: computing means (510) for computing a model-based motion vector for the pixel on basis of a motion model being determined on basis of a part of (402-436) a motion vector field (400) of the image; comparing means (511) for comparing the model-based motion vector with each of the motion vectors of the set of motion vectors; and selecting means (512) for selecting a particular motion vector of the set of motion vectors on basis of the comparing and for assigning the particular motion vector as the background motion vector.

Abstract translation: 一种用于从针对图像计算的一组运动矢量中选择用于图像的遮挡区域中的像素的背景运动矢量的选择器（502），包括：计算装置（510），用于计算基于模型的运动矢量， 基于图像的运动矢量场（400）的一部分（402-436）确定基于运动模型的像素; 比较装置（511），用于将基于模型的运动矢量与该组运动矢量的每个运动矢量进行比较; 以及用于基于所述比较选择所述一组运动矢量的特定运动矢量并且用于将所述特定运动矢量分配为所述背景运动矢量的选择装置（512）。

公开(公告)号：US09793144B2

公开(公告)日：2017-10-17

申请号：US13220903

申请日：2011-08-30

Applicant: Juergen Kielwein ,  Bart Scholte Von Mast ,  Rogier Lodder

Inventor： Juergen Kielwein ,  Bart Scholte Von Mast ,  Rogier Lodder

IPC: H01L21/00 ,  H01L21/67

CPC classification number: H01L21/67115

Abstract: A wafer holder and temperature controlling arrangement has a metal circular wafer carrier plate, which covers a heater compartment. In the heater compartment a multitude of heater lamp tubes is arranged, which directly acts upon the circular wafer carrier plate. Latter is drivingly rotatable about the central axis. A wafer is held on the circular wafer carrier plate by means of a weight-ring residing upon the periphery of a wafer deposited on the wafer carrier plate.

公开(公告)号：US07206027B2

公开(公告)日：2007-04-17

申请号：US10493793

申请日：2002-10-18

Applicant: Gerard De Haan ,  Rogier Lodder

Inventor： Gerard De Haan ,  Rogier Lodder

IPC: H04N7/01

CPC classification number: G06T3/403

Abstract: The invention relates to a method and a device to increase the resolution of an image by interpolating along edges of the image. Edges are detected and their direction is calculated (10). The interpolation (12) of new pixels is carried out along the direction of the edges. According to the invention, a pre-filter (8) is used with a high-pass filtering in the direction in which new pixels are interpolated, and a low-pass filtering in another direction.

Abstract translation: 本发明涉及一种通过沿图像边缘内插来增加图像分辨率的方法和装置。 检测边缘，计算其方向（10）。 新像素的插值（12）沿着边缘的方向被执行。 根据本发明，使用预滤波器（8），在新像素被插值的方向上进行高通滤波，并且在另一个方向上进行低通滤波。

公开(公告)号：US20050018077A1

公开(公告)日：2005-01-27

申请号：US10493793

申请日：2002-10-18

Applicant: Gerard De Haan ,  Rogier Lodder

Inventor： Gerard De Haan ,  Rogier Lodder

IPC: G06T3/40 ,  G09G5/00 ,  G09G5/391 ,  H04N7/01 ,  H04N11/20

CPC classification number: G06T3/403

Abstract: The invention relates to a method and a device to increase the resolution of an image by interpolating along edges of the image. Edges are detected and their direction is calculated (10). The interpolation (12) of new pixels is carried out along the direction of the edges. According to the invention, a pre-filter (8) is used with a high-pass filtering in the direction in which new pixels are interpolated, and a low-pass filtering in another direction.

Abstract translation: 本发明涉及一种通过沿图像边缘内插来增加图像分辨率的方法和装置。 检测边缘，计算其方向（10）。 新像素的插值（12）沿着边缘的方向被执行。 根据本发明，使用预滤波器（8），在新像素被插值的方向上进行高通滤波，并且在另一个方向上进行低通滤波。

公开(公告)号：US09252037B2

公开(公告)日：2016-02-02

申请号：US13997801

申请日：2011-12-27

Applicant: Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

Inventor： Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

IPC: H01L21/677 ,  H01L21/67

CPC classification number: C23C16/458 ,  C23C14/50 ,  C23C14/541 ,  C23C16/4412 ,  C23C16/52 ,  F04B45/02 ,  H01J37/32724 ,  H01J37/32834 ,  H01J2237/3321 ,  H01L21/6719 ,  H01L21/67703 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/6776

Abstract: A vacuum treatment apparatus and method for manufacturing has a plurality of treatment chambers for treating workpieces, in particular silicon wafers, a transfer chamber attached to the treatment chambers communicating via respective openings and having handling zones located adjacent to each of the treatment chambers. A workpiece carrier is arranged within the transfer chamber and configured to transfer the workpieces between the handling zones, and one or more handlers for moving the workpieces between the handling zones and the treatment chambers. The transfer chamber is ring-shaped about an axis and the openings have opening substantially parallel thereto. This way, forces on the transfer chamber are redirected to a large support structure and thus, a cost-effective, light and still rigid mechanical construction can be achieved.

Abstract translation: 真空处理装置和制造方法具有多个用于处理工件，特别是硅晶片的处理室，附接到经由各个开口连通的处理室的传送室，并且具有位于每个处理室附近的处理区域。 工件载体布置在传送室内并且构造成在处理区域之间传送工件，以及用于在处理区域和处理室之间移动工件的一个或多个处理器。 传送室围绕轴线是环形的并且开口具有基本上与其平行的开口。 这样，转移室上的力被重定向到大的支撑结构，因此，可以实现成本有效，轻且刚性的机械结构。

公开(公告)号：US20130287527A1

公开(公告)日：2013-10-31

申请号：US13997801

申请日：2011-12-27

Applicant: Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

Inventor： Bart Scholte Von Mast ,  Wolfgang Rietzler ,  Rogier Lodder ,  Rolf Bazlen ,  Daniel Rohrer

IPC: H01L21/677

CPC classification number: C23C16/458 ,  C23C14/50 ,  C23C14/541 ,  C23C16/4412 ,  C23C16/52 ,  F04B45/02 ,  H01J37/32724 ,  H01J37/32834 ,  H01J2237/3321 ,  H01L21/6719 ,  H01L21/67703 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/6776

Abstract: A vacuum treatment apparatus and method for manufacturing has a plurality of treatment chambers for treating workpieces, in particular silicon wafers, a transfer chamber attached to the treatment chambers communicating via respective openings and having handling zones located adjacent to each of the treatment chambers. A workpiece carrier is arranged within the transfer chamber and configured to transfer the workpieces between the handling zones, and one or more handlers for moving the workpieces between the handling zones and the treatment chambers. The transfer chamber is ring-shaped about an axis and the openings have opening substantially parallel thereto. This way, forces on the transfer chamber are redirected to a large support structure and thus, a cost-effective, light and still rigid mechanical construction can be achieved.

Abstract translation: 真空处理装置和制造方法具有多个用于处理工件，特别是硅晶片的处理室，附接到经由各个开口连通的处理室的传送室，并且具有位于每个处理室附近的处理区域。 工件载体布置在传送室内并且构造成在处理区域之间传送工件，以及用于在处理区域和处理室之间移动工件的一个或多个处理器。 传送室围绕轴线是环形的并且开口具有基本上与其平行的开口。 这样，转移室上的力被重定向到大的支撑结构，因此，可以实现成本有效，轻且刚性的机械结构。

公开(公告)号：US20130052834A1

公开(公告)日：2013-02-28

申请号：US13220903

申请日：2011-08-30

Applicant: Juergen Kielwein ,  Bart Scholte Von Mast ,  Rogier Lodder

Inventor： Juergen Kielwein ,  Bart Scholte Von Mast ,  Rogier Lodder

IPC: H01L21/31 ,  F27D11/12

CPC classification number: H01L21/67115

Abstract: A wafer holder and temperature controlling arrangement has a metal circular wafer carrier plate, which covers a heater compartment. In the heater compartment a multitude of heater lamp tubes is arranged, which directly acts upon the circular wafer carrier plate. Latter is drivingly rotatable about the central axis. A wafer is held on the circular wafer carrier plate by means of a weight-ring residing upon the periphery of a wafer deposited on the wafer carrier plate.

Abstract translation: 晶片保持器和温度控制装置具有覆盖加热器隔室的金属圆形晶片承载板。 在加热器隔室中设置有多个加热器灯管，其直接作用在圆形晶片载体板上。 后者可绕中心轴线旋转。 通过位于晶片承载板上淀积的晶片周围的重量环将晶片保持在圆形晶片承载板上。

公开(公告)号：US20070182859A1

公开(公告)日：2007-08-09

申请号：US10598230

申请日：2005-02-24

Applicant: Gerben Hekstra ,  Ihor Kirenko ,  Marco Bosma ,  Frederik De Bruijn ,  Gerard De Haan ,  Rogier Lodder ,  Abraham Riemens

Inventor： Gerben Hekstra ,  Ihor Kirenko ,  Marco Bosma ,  Frederik De Bruijn ,  Gerard De Haan ,  Rogier Lodder ,  Abraham Riemens

IPC: H04N5/21 ,  H04N9/64 ,  H04N5/14 ,  H04N5/91

CPC classification number: H04N9/646 ,  G06T5/001 ,  H04N5/142

Abstract: The invention relates to a signal processing system comprising first electronic means for storing an input signal, second means for a real-time processing of the input signal thus stored, and third electronic means for storing the signal thus processed. This system is according to the invention, characterized in that said second processing means themselves comprise off-line signal enhancement means applied to said input signal and using available processing resources, not still used for real-time or on-line processing, for delivering an enhanced signal and storing it in said third means for storing the signal processed by the second processing means. The signal enhancement means may also comprise means for modifying said enhanced signal, said third electronic means for storing the processed signal being also able to store the enhanced signal thus modified, and the third electronic means for storing the signal processed may be provided for outputting the enhanced signal and/or the modified enhanced signal in real time.

Abstract translation: 本发明涉及一种信号处理系统，包括用于存储输入信号的第一电子装置，用于对由此存储的输入信号进行实时处理的第二装置，以及用于存储由此处理的信号的第三电子装置。 该系统根据本发明，其特征在于，所述第二处理装置本身包括应用于所述输入信号的离线信号增强装置，并使用尚未用于实时或在线处理的可用处理资源，用于传送 增强信号并将其存储在所述第三装置中，用于存储由第二处理装置处理的信号。 信号增强装置还可以包括用于修改所述增强信号的装置，用于存储经处理的信号的所述第三电子装置也能够存储如此修改的增强信号，并且可以提供用于存储处理的信号的第三电子装置，用于输出 增强信号和/或修改的增强信号。