Invention Grant
- Patent Title: Acid generators and photoresists comprising same
- Patent Title (中): 含酸产生剂和含有它的光致抗蚀剂
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Application No.: US13854078Application Date: 2013-03-30
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Publication No.: US09256125B2Publication Date: 2016-02-09
- Inventor: Emad Aqad , Irvinder Kaur , Cong Liu , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials, LLC
- Current Assignee: Rohm and Haas Electronic Materials, LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D319/06 ; C07D317/34 ; C07D317/72 ; C07D319/08 ; C07C309/12 ; G03F7/039
Abstract:
Acid generator compounds are provided that comprise an oxo-1,3-dioxolane moiety and/or an oxo-1,3-dioxane moiety. The acid generators are particularly useful as a photoresist composition component.
Public/Granted literature
- US20140295347A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2014-10-02
Information query
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