公开(公告)号：US12276910B2

公开(公告)日：2025-04-15

申请号：US17339522

申请日：2021-06-04

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Brandon Wenning ,  Choong-Bong Lee ,  James W. Thackeray ,  Ke Yang ,  James F. Cameron

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  G03F7/004 ,  G03F7/038

Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.

公开(公告)号：US20240241440A1

公开(公告)日：2024-07-18

申请号：US18090145

申请日：2022-12-28

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Li Cui ,  Yinjie Cen ,  Wenxu Zhang ,  Mingqi Li ,  James F. Cameron

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/1808 ,  C08F220/1809 ,  G03F7/038

Abstract: A polymer, including a first repeating unit comprising a sulfone group, wherein the sulfone group is directly bonded to a group of formula —C(Ra)(Rb)—; and a second repeating unit comprising an acid labile group, a base-decomposable group, a polar group, or a combination thereof, wherein Ra and Rb are each independently hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C3-30 cycloalkenyl, substituted or unsubstituted C3-30 heterocycloalkenyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C2-30 heteroaryl, substituted or unsubstituted C3-30 heteroarylalkyl, or substituted or unsubstituted C3-30 alkylheteroaryl, provided that at least one of Ra and Rb is hydrogen.

公开(公告)号：US11932713B2

公开(公告)日：2024-03-19

申请号：US16236883

申请日：2018-12-31

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: G03F7/38 ,  C07F11/00 ,  C08F230/04 ,  C09D133/04 ,  C09D133/14 ,  C09D143/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: C08F230/04 ,  C07F11/00 ,  C09D133/04 ,  C09D133/14 ,  C09D143/00 ,  G03F7/0042 ,  G03F7/038 ,  G03F7/039 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/322 ,  G03F7/38

Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.

公开(公告)号：US20240027904A1

公开(公告)日：2024-01-25

申请号：US18352646

申请日：2023-07-14

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Tomas Marangoni ,  Yinjie Cen ,  Paul J. LaBeaume ,  Mingqi Li ,  James F. Cameron

IPC: G03F7/004 ,  C07D417/06 ,  C07D275/06

CPC classification number: G03F7/0045 ,  C07D417/06 ,  C07D275/06

Abstract: A photoactive compound including an organic cation; and an anion represented by Formula (1):




wherein X is an organic group; Y1 and Y2 are each independently a non-hydrogen substituent; Y1 and Y2 together optionally form a ring; Z2 is hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-50 aryl, substituted or unsubstituted C7-50 arylalkyl, substituted or unsubstituted C7-50 alkylaryl, substituted or unsubstituted C6-50 aryloxy, substituted or unsubstituted C3-30 heteroaryl, substituted or unsubstituted C4-30 alkylheteroaryl, substituted or unsubstituted C4-30 heteroarylalkyl, or substituted or unsubstituted C3-30 heteroaryloxy; Z2 optionally further comprises one or more divalent linking groups as part of its structure; Z2 and one of Y1 or Y2 together optionally form a ring; X and Z2 together optionally form a ring; and X and one of Y1 or Y2 together optionally form a ring.

公开(公告)号：US20210109447A1

公开(公告)日：2021-04-15

申请号：US16653659

申请日：2019-10-15

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. ,  ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Hye-Won Lee ,  Min Kyung Jang ,  Soo Jung Leem ,  Jae Hwan Sim ,  Emad Aqad

IPC: G03F7/11 ,  C08F220/34 ,  C09D133/14 ,  G03F7/09 ,  C09D5/00 ,  C08F226/06 ,  C09D139/08 ,  C08G73/02 ,  C09D179/02

Abstract: A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.

公开(公告)号：US20200209743A1

公开(公告)日：2020-07-02

申请号：US16236952

申请日：2018-12-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Tomas Marangoni ,  Mingqi Li ,  Jong Keun Park ,  Emad Aqad ,  Amy M. Kwok

IPC: G03F7/038 ,  G03F7/004

Abstract: A photoresist composition, including a polymer having a C6-30 hydroxyaromatic group, a solvent, and a sulfonium salt having Formula (I): wherein, in Formula (I), R, R1 to R8, X, n, and Rf are the same as described in the specification.

公开(公告)号：US20190204743A1

公开(公告)日：2019-07-04

申请号：US16236725

申请日：2018-12-31

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Joshua Kaitz ,  Tomas Marangoni ,  Emad Aqad ,  Amy M. Kwok ,  Mingqi Li ,  Thomas Cardolaccia ,  Choong-Bong Lee ,  Ke Yang ,  Cong Liu

IPC: G03F7/11 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C09D133/16 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/28 ,  C08F220/24

CPC classification number: G03F7/11 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/283 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  G03F7/38

Abstract: New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).

公开(公告)号：US20180284605A1

公开(公告)日：2018-10-04

申请号：US15475630

申请日：2017-03-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  James W. Thackeray

IPC: G03F7/004 ,  C07C69/54 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US09880469B2

公开(公告)日：2018-01-30

申请号：US14792968

申请日：2015-07-07

Applicant: Rohm and Haas Electronic Materials LLC ,  Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Emad Aqad ,  Mingqi Li ,  Shintaro Yamada ,  Sung Wook Cho

IPC: G03F7/09 ,  G03F7/36 ,  G03F7/30 ,  C07C39/17 ,  C07C39/14 ,  C07D213/16 ,  C08G8/04 ,  C08G8/10 ,  C08G12/34 ,  C08G12/26 ,  C08G12/08 ,  C09D161/06 ,  C09D161/22 ,  C08G8/08

CPC classification number: G03F7/094 ,  C07C39/14 ,  C07C39/17 ,  C07C2603/18 ,  C07C2603/24 ,  C07C2603/40 ,  C07C2603/42 ,  C07C2603/50 ,  C07C2603/52 ,  C07D213/16 ,  C08G8/04 ,  C08G8/08 ,  C08G8/10 ,  C08G12/08 ,  C08G12/26 ,  C08G12/34 ,  C09D161/06 ,  C09D161/22 ,  C09D161/26 ,  G03F7/091 ,  G03F7/30 ,  G03F7/36

Abstract: Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.

公开(公告)号：US09256125B2

公开(公告)日：2016-02-09

申请号：US13854078

申请日：2013-03-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  Irvinder Kaur ,  Cong Liu ,  Cheng-Bai Xu

IPC: G03F7/004 ,  C07D319/06 ,  C07D317/34 ,  C07D317/72 ,  C07D319/08 ,  C07C309/12 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C2603/74 ,  C07D317/34 ,  C07D317/72 ,  C07D319/06 ,  C07D319/08 ,  G03F7/039 ,  G03F7/0392

Abstract: Acid generator compounds are provided that comprise an oxo-1,3-dioxolane moiety and/or an oxo-1,3-dioxane moiety. The acid generators are particularly useful as a photoresist composition component.

Abstract translation: 提供酸产生剂化合物，其包含氧代-1,3-二氧戊环部分和/或氧代-1,3-二恶烷部分。 酸发生剂特别可用作光致抗蚀剂组合物组分。