Invention Grant
- Patent Title: Micro-channel plate, method for manufacturing micro-channel plate, and image intensifier
- Patent Title (中): 微通道板,微通道板的制造方法和图像增强器
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Application No.: US14429894Application Date: 2013-07-11
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Publication No.: US09257266B2Publication Date: 2016-02-09
- Inventor: Kimitsugu Nakamura , Yasumasa Hamana , Takaaki Nagata
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2012-211194 20120925
- International Application: PCT/JP2013/069001 WO 20130711
- International Announcement: WO2014/050260 WO 20140403
- Main IPC: H01J43/24
- IPC: H01J43/24 ; H01J31/50 ; H01J43/28 ; H01J9/12

Abstract:
In a micro-channel plate, an electron emission film and an ion barrier film formed on a substrate are integrally formed by the same film formation step. In this structure, the electron emission film and the ion barrier film are made as continuous and firm films and the ion barrier film can be made thinner. Since the ion barrier film is formed on the back side of an organic film, the organic film is exposed during removal of the organic film. This prevents the organic film from remaining and thus suppresses degradation of performance of the ion barrier film due to the residual organic film, so as to suppress ion feedback from the micro-channel plate and achieve a sufficient improvement in life characteristics of an image intensifier.
Public/Granted literature
- US20150279639A1 MICRO-CHANNEL PLATE, METHOD FOR MANUFACTURING MICRO-CHANNEL PLATE, AND IMAGE INTENSIFIER Public/Granted day:2015-10-01
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