发明授权
- 专利标题: Inspection recipe setup from reference image variation
- 专利标题(中): 参考图像变化检查配方设置
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申请号: US14707573申请日: 2015-05-08
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公开(公告)号: US09262821B2公开(公告)日: 2016-02-16
- 发明人: Eugene Shifrin , Chetana Bhaskar , Ashok V. Kulkarni , Chien-Huei (Adam) Chen , Kris Bhaskar , Brian Duffy
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corp.
- 当前专利权人: KLA-Tencor Corp.
- 当前专利权人地址: US CA Milpitas
- 代理商 Ann Marie Mewherter
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; G06T7/00
摘要:
Systems and methods for generating information for use in a wafer inspection process are provided. One method includes acquiring output of an inspection system for die(s) located on wafer(s), combining the output for the die(s) based on within die positions of the output, determining, on a within die position basis, a statistical property of variation in values of characteristic(s) of the combined output, and assigning the within die positions to different groups based on the statistical properties determined for the within die positions. The method also includes storing information for the within die positions and the different groups to which the within die positions are assigned in a storage medium that is accessible to the inspection system for performing the wafer inspection process, which includes applying defect detection parameter(s) to additional output of the inspection system generated for a wafer based on the information thereby detecting defects on the wafer.
公开/授权文献
- US20150324964A1 Inspection Recipe Setup from Reference Image Variation 公开/授权日:2015-11-12